Femtosecond Laser Plasmonic Nanolithography for Color Printing in Silicon

Femtosecond laser processing enables large‐scale precise fabrication of micro/nanostructures on silicon surface demonstrating exceptional potential for integrated optoelectronic applications. Herein, a hybrid fabrication strategy combining ion implantation with femtosecond laser plasmonic nanolithography is developed. By leveraging localized surface plasmon resonance effect of embedded Ag nanoparticles in silicon (Ag NPs: Si), high‐precision color printing and self‐assembled nanostructures formation at an ultralow energy threshold (≈0.01 J cm²) are achieved. Systematic control of laser parameters allows precise manipulation of Ag NPs, regulating the size and spatial distribution, which overcomes the inherent nonlinear absorption limitation of silicon. Raman spectroscopy reveals enhanced Ag–Si interface coupling induced in the laser‐treated locations, providing critical insights into optimization of laser‐driven nanoscale interactions. This study establishes an approach to optical response modulation and carrier mobility engineering in Ag NPs: Si, which contributes to the preparation of multifunctional integrated devices such as structured color displays, high‐density optical storage, and optoelectronic sensors.