journal article·2004-03-01

A physics-based VLSI interconnect model including substrate and conductor skin effects

H Ymeri, B Nauwelaers, Karen Maex, D De Roest

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Abstract

The goal of this work was to model the influence of the substrate and conductor skin effects on the RL line characteristics of on-chip interconnects. The proposed modelling approach is based on the skin-effect theory results for rectangular wires and the complex integration technique for perturbation series per unit length impedance of silicon substrate. It is shown that the calculated frequency-dependent distributed inductance and the associated resistance are in good agreement with the results obtained from rigorous full-wave solutions and CAD-oriented analytic modelling technique.
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Research context

OpenAlex topics: Electromagnetic Compatibility and Noise Suppression · VLSI and FPGA Design Techniques · 3D IC and TSV technologies

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