Design of Dual-Frequency Plasmonic Photo-Coupler for Infrared Phototransistors

Infrared phototransistors with very high performance show great potential in optoelectronic application, attributable to the intrinsic high transconductive gain of the transistor structure and therefore very large photo-responsivity. To distinguish multispectral information with phototransistors, however, the coincident spectral light has to been laterally dispersed and thereby coupled to the individual photo-gates sensing different target bands. Here, the dual-frequency plasmonic photo-coupler based on a single perforated metallic layer is numerically designed in the infrared region to improve photon absorption efficiency at two target wavelengths. The geometric parameters of the plasmonic grating composed of large and small cross-shaped holes are independently tuned to control the resonance frequencies under different incident (x- and y-) polarization conditions. While the dual-frequency resonant modes are induced by the hybridization between localized surface plasmons (LSPs) and propagating surface plasmons (PSPs), it is found that LSPs play the dominant role and can be effectively adjusted to achieve the target dual-frequency response. More importantly, the spectral response with low- (high-) frequency resonance corresponding to large (small) cross-hole region matches the spatially distributed photogates of the phototransistor structure and therefore realizes near-field enhancement and hence large photoresponsivity at target dual frequencies. In addition, the spectral response for x- and y-polarizations can be unified despite of the apparently broken symmetry between these two polarizations. Our work provides a general strategy to realize sensitive multiband-infrared phototransistors which require only state-of-the-art planar technology and are applicable for highly sensitive infrared photodetection.