High Contact Resistivity Enabling Low‐Energy Operation in Cr2Ge2Te6‐Based Phase‐Change Random Access Memory
Source abstract
Abstract
A phase‐change material (PCM) exhibiting a significant difference in resistance between the amorphous and crystalline phases can be used for phase‐change random access memory (PCRAM). Reduction of the energy to operate is one of the major challenges in PCRAM technology. One strategy for energy reduction is to increase the resistance of the memory device in the crystalline state of the PCM. Cr2Ge2Te6 (CrGT) shows p‐type semiconductor characteristics in both the amorphous and crystalline phases. A CrGT‐based memory device shows a contact resistance–dominant behavior, suggesting that the resistance of a CrGT‐based memory device can be increased by changing the electrode material. The contact resistivity (ρc) of a CrGT/electrode increases with a decrease in the work function of the electrode material in both amorphous and crystalline phases, as with general p‐type semiconductor materials. The highest ρc is observed for a LaB6 electrode. The resistance of the CrGT‐based device with a LaB6 electrode (LaB6 device) is three or four orders of magnitude greater than that of a device with a W electrode (W device). The LaB6 device is indicated to require much smaller operation energy than the W device.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Phase-change materials and chalcogenides · Transition Metal Oxide Nanomaterials · Advanced Memory and Neural Computing
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Materials Science Graduate School of Engineering Tohoku University 6-6-11, Aoba-yama, Aoba-ku Sendai 980-8579 Japan
References (27)
Show source-provided references
1. 10.1038/nmat200910.1038/nmat2009 ↗
2. 10.1109/JPROC.2010.207005010.1109/JPROC.2010.2070050 ↗
3. 10.1557/mrs.2014.13910.1557/mrs.2014.139 ↗
4. 10.1002/adfm.20180338010.1002/adfm.201803380 ↗
5. 10.1002/pssr.20180055810.1002/pssr.201800558 ↗
6. 10.1109/TED.2007.91163010.1109/TED.2007.911630 ↗
7. 10.1109/TED.2017.274634210.1109/TED.2017.2746342 ↗
8. L.Jiang Y.Zhang J.Yang inProc. 2014 44th Annual IEEE/IFIP International Conf. on Dependable Systems and Networks IEEE Atlanta GA2014 p.216.
9. H.Horii J. H.Yi J. H.Park Y. H.Ha I. G.Baek S. O.Park Y. N.Hwang S. H.Lee Y. T.Kim K. H.Lee U.Chung J. T.Moon inProc. 2003 Symp. on VLSI Technology IEEE Kyoto Japan2003 p.177.
10. 10.1149/2.0081512ssl10.1149/2.0081512ssl ↗
11. D.Roy M. A. A.in't Zandt R. A. M.Wolters C. E.Timmering J. H.Klootwijk inProc. 2009 10th Annual Non-Volatile Memory Technology Symp. IEEE Portland OR2009 p.12.
12. 10.1088/0268-1242/29/9/09500310.1088/0268-1242/29/9/095003 ↗
13. 10.1016/j.mssp.2016.02.00610.1016/j.mssp.2016.02.006 ↗
14. 10.1063/1.502932710.1063/1.5029327 ↗
15. 10.1063/1.492122610.1063/1.4921226 ↗
16. Sze S. M. · 2007
17. 10.1021/acsami.7b1675510.1021/acsami.7b16755 ↗
18. 10.1063/1.32353910.1063/1.323539 ↗
19. 10.30556/imj.Vol21.No1.2018.66110.30556/imj.Vol21.No1.2018.661 ↗
20. 10.1016/0169-4332(93)90612-F10.1016/0169-4332(93)90612-F ↗
21. 10.1063/1.165709210.1063/1.1657092 ↗
22. 10.1021/acsami.9b1153510.1021/acsami.9b11535 ↗
23. 10.1016/j.rinma.2020.10015510.1016/j.rinma.2020.100155 ↗
24. 10.1088/1361-6463/aafa9410.1088/1361-6463/aafa94 ↗
25. 10.1016/j.ssc.2006.05.03110.1016/j.ssc.2006.05.031 ↗
26. 10.1149/2.0191605jss10.1149/2.0191605jss ↗
27. 10.1038/s41467-019-13747-510.1038/s41467-019-13747-5 ↗