Direct deposition strategy for highly ordered inorganic organic perovskite thin films and their optoelectronic applications

A direct deposition methodology has been optimized for highly crystalline inorganic-organic (IO) perovskite thin films. The simplest deposition ensures long-range order with high c-oriented thin films, thicknesses ranging from ultra-thin (~20nm) and upto 1.5 µm. These self-assembled layered perovskites are naturally aligned alternative stacking arrangement of inorganic and organic monolayers, resemble multiple quantum wells (MQWs), which offers superior optoelectronic properties such as room-temperature optical excitons, strong electrically induced photo-carrier mobilities etc. The established fabrication is having device-compatible advantage over other conventional solution–processed thin films wherein the optical features are restricted by thickness limitations (<200nm) and with possible corrugated surface morphologies with multi-phases. The universally acceptable ability has been demonstrated for wide varieties of organic moieties (R) as well as different lead halide networks in type (R-NH3)2PbX4 (X = I, Br,Cl).The potential of the direct deposition methodology for demonstrated in 3D template structure fabrication as well as in photocurrent response capability.