journal article·2020-10-28Open access

Electrothermal transport induced material reconfiguration and performance degradation of CVD-grown monolayer MoS2 transistors

Ansh, Jeevesh Kumar, Gaurav Sheoran, Mayank Shrivastava

Abstract

Abstract Device and material reliability of 2-dimensional materials, especially CVD-grown MoS2, has remained un-addressed since 2011 when the first TMDC transistor was reported. For its potential application in next generation electronics, it is imperative to update our understanding of mechanisms through which MoS2 transistors’ performance degrades under long-term electrical stress. We report, for CVD-grown monolayer MoS2, results on temporal degradation of material and device performance under electrical stress. Both low and high field regimes of operation are explored at different temperatures, gate bias and stress cycles. During low field operation, current is found to saturate after hundreds of seconds of operation with the current decay time constant being a function of temperature and stress cycle. High field operation, especially at low temperature, leads to impact ionization assisted material and device degradation. It is found that high field operation at low temperature results in amorphization of the channel and is verified by device and kelvin probe force microscopy (KPFM) analyses. In general, a prolonged room temperature operation of CVD-grown MoS2 transistors lead to degraded gate control, higher OFF state current and negative shift in threshold voltage (VT). This is further verified, through micro-Raman and photoluminescence spectroscopy, which suggest that a steady state DC electrical stress leads to the formation of localized low resistance regions in the channel and a subsequent loss of transistor characteristics. Our findings unveil unique mechanism by which CVD MoS2 undergoes material degradation under electrical stress and subsequent breakdown of transistor behavior. Such an understanding of material and device reliability helps in determining the safe operating regime from device as well as circuit perspective.
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Research context

OpenAlex topics: 2D Materials and Applications · Ferroelectric and Negative Capacitance Devices · MXene and MAX Phase Materials

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References (42)

Show source-provided references
1. Manish, C., Jena, D. & Zhang, H. Two-dimensional semiconductors for transistors. Nat. Rev. Mater. 1.11, 1–15 (2016).
2. Schwierz, F., Pezoldt, J. & Granzner, R. Two-dimensional materials and their prospects in transistor electronics. Nanoscale 7.18, 8261–8283 (2015).10.1039/C5NR01052G ↗
3. Radisavljevic, B., Radenovic, A., Brivio, J., Giacometti, V. & Kis, A. Single-layer MoS2 transistors. Nat. Nano. 6.3, 147 (2011).10.1038/nnano.2010.279 ↗
4. Kang, J., Wei L., and Banerjee, K., High-performance MoS2 transistors with low-resistance molybdenum contacts, App. Phy. Lett. 104, 093106, (2014).10.1063/1.4866340 ↗
5. Das, S., Chen, H.-Y., Penumatcha, A. V. & Appenzeller, J. High performance multilayer MoS2 transistors with scandium contacts. Nano Lett. 13.1, 100–105 (2013).10.1021/nl303583v ↗
6. Liu, W. et al. High-performance few-layer-MoS2 field-effect-transistor with record low contact-resistance (2013 IEEE International Electron Devices Meeting, Washington, USA, 2013).10.1109/IEDM.2013.6724660 ↗
7. Wu, W. et al. High mobility and high on/off ratio field-effect transistors based on chemical vapor deposited single-crystal MoS2 grains. App. Phy. Lett. 102, 142106 (2013).10.1063/1.4801861 ↗
8. Bhattacharjee, S., Ganapathi, K., Mohan, S. & Bhat, N. A sub-thermionic MoS2 FET with tunable transport. App. Phy. Lett. 111, 163501 (2017).10.1063/1.4996953 ↗
9. Kang, J., Liu, W., Sarkar, D., Jena, D. & Banerjee, K. Computational study of metal contacts to monolayer transition-metal dichalcogenide semiconductors. Phy. Rev. X 4, 031005 (2014).
10. Hemanjaneyulu, K., Kumar, J. & Shrivastava, M. MoS2 doping using potassium iodide for reliable contacts and efficient FET operation. IEEE Trans. Elec. Dev. 66, 3224–3228 (2019).10.1109/TED.2019.2916716 ↗
11. Yang, L. et al. Chloride molecular doping technique on 2D materials: WS2 and MoS2. Nano Lett. 14, 6275–6280 (2014).10.1021/nl502603d ↗
12. Kiriya, D., Tosun, M., Zhao, P., Kang, J. & Javey, A. Air-stable surface charge transfer doping of MoS2 by benzyl viologen. J. Am. Chem. Soc. 136, 7853–7856 (2014).10.1021/ja5033327 ↗
13. Bhattacharjee, S., Ganapathi, K., Nath, D. N. & Bhat, N. Surface state engineering of metal/MoS2 contacts using sulfur treatment for reduced contact resistance and variability. IEEE Trans. Elec. Dev. 63, 2556–2562 (2016).10.1109/TED.2016.2554149 ↗
14. Laskar, M. R. et al. p-type doping of MoS2 thin films using Nb. App. Phy. Lett. 104, 092104 (2014).10.1063/1.4867197 ↗
15. Ansh et al. Chalcogen-assisted enhanced atomic orbital interaction at TMD–metal interface and sulfur passivation for overall performance boost of 2-D TMD FETs. IEEE Trans. Elec. Dev. 67, 717–724 (2020).10.1109/TED.2019.2958338 ↗
16. Kappera, R. et al. Phase-engineered low-resistance contacts for ultrathin MoS2 transistors. Nat. Mater. 13, 1128–1134 (2014).10.1038/nmat4080 ↗
17. Chen, H. et al. Ultrafast formation of interlayer hot excitons in atomically thin MoS2/WS2 heterostructures. Nat. Commun. 7, 1–8 (2016).
18. Huo, N. et al. Novel and enhanced optoelectronic performances of multilayer MoS2–WS2 heterostructure transistors. Adv. Funct. Mater. 24, 7025–7031 (2014).10.1002/adfm.201401504 ↗
19. Lee, J., Yoon, J.-H., Shin, G.-H. & Lee, C.-H. Two-dimensional semiconductor optoelectronics based on van der Waals heterostructures. Nanomaterials 6, 193 (2016).10.3390/nano6110193 ↗
20. Roy, T. et al. Dual-gated MoS2/WSe2 van der Waals tunnel diodes and transistors. ACS Nano 9, 2071–2079 (2015).10.1021/nn507278b ↗
21. Cheng, P., Sun, K. & Hu, Y. H. Memristive behavior and ideal memristor of 1T phase MoS2 nanosheets. Nano Lett. 16, 572–576 (2016).10.1021/acs.nanolett.5b04260 ↗
22. Li, D. et al. MoS2 memristors exhibiting variable switching characteristics toward biorealistic synaptic emulation. ACS Nano 12, 9240–9252 (2018).10.1021/acsnano.8b03977 ↗
23. Ge, R. et al. Atomristor: nonvolatile resistance switching in atomic sheets of transition metal dichalcogenides. Nano Lett. 18, 434–441 (2018).10.1021/acs.nanolett.7b04342 ↗
24. Late, D. J., Liu, B., Ramakrishna Matte, H. S. S., Dravid, V. P. & Rao, C. N. R. Hysteresis in single-layer MoS2 field effect transistors. ACS Nano 6, 5635–5641 (2012).10.1021/nn301572c ↗
25. Di, B. et al. Hysteresis in the transfer characteristics of MoS2 transistors. 2D Mater. 5, 015014 (2017).10.1088/2053-1583/aa91a7 ↗
26. Kripalani, D. R., Cai, Y., Xue, M. & Zhou, K. Metastable interlayer Frenkel pair defects in black phosphorus. Phy. Rev. B 100, 224107 (2019).10.1103/PhysRevB.100.224107 ↗
27. Liu, B. et al. Thermal conductivity and tensile response of phosphorene nanosheets with vacancy defects. J. Phy. Chem. C 121, 13876–13887 (2017).10.1021/acs.jpcc.7b02933 ↗
28. Lembke, D. & Kis, A. Breakdown of high-performance monolayer MoS2 transistors. ACS Nano 6, 10070–10075 (2012).10.1021/nn303772b ↗
29. Pak, J. et al. Two-dimensional thickness-dependent avalanche breakdown phenomena in MoS2 field-effect transistors under high electric fields. ACS Nano 12, 7109–7116 (2018).10.1021/acsnano.8b02925 ↗
30. Mishra, A., et al. First demonstration and physical insights into time-dependent breakdown of graphene channel and interconnects, In IEEE International Reliability Physics Symposium (IRPS), 1–6 (IEEE, USA, 2019).10.1109/IRPS.2019.8720452 ↗
31. Li, H. et al. From bulk to monolayer MoS2: evolution of Raman scattering. Adv. Funct. Mater. 22, 1385–1390 (2012).10.1002/adfm.201102111 ↗
32. Ansh, Sheoran, G., Kumar, J. and Shrivastava, M., First insights into electro-thermal stress driven time-dependent permanent degradation failure of CVD monolayer MoS2 channel, In IEEE International Reliability Physics Symposium (IRPS), 1–4 (2020).10.1109/IRPS45951.2020.9129173 ↗
33. Lundstrom, Mark Fundamentals of Nanotransistors, Vol. 6 (World Scientific Publishing Company, 2017).10.1142/9018 ↗
34. Sze, Simon M., and Kwok K. Ng, Physics of semiconductor devices, (John wiley & sons, 2006).10.1002/0470068329 ↗
35. Mishra, A. & Shrivastava, M. Remote joule heating assisted carrier transport in MWCNTS probed at nanosecond time scale. Phys. Chem. Chem. Phys. 18, 28932–28938 (2016).10.1039/C6CP04497B ↗
36. Wu, T., Cao, X. & Guo, J. Compact model of carrier transport in monolayer transition metal dichalcogenide transistors. IEEE Trans. Elec. Dev. 66, 177–183 (2019).10.1109/TED.2018.2866095 ↗
37. Lee, C. A., Logan, R. A., Batdorf, R. L., Kleimack, J. J. & Wiegmann, W. Ionization rates of holes and electrons in silicon. Phys. Rev. 134, A761 (1964).10.1103/PhysRev.134.A761 ↗
38. He, G. et al. Matsunaga conduction mechanisms in CVD-grown monolayer MoS2 transistors: from variable-range hopping to velocity saturation. Nano Lett. 15, 5052–5058 (2015).10.1021/acs.nanolett.5b01159 ↗
39. Smithe, K. K. H., Chris, D. E, Suryavanshi, S. V. & Pop, E High-field transport and velocity saturation in synthetic monolayer MoS2. Nano Lett. 18, 4516–4522 (2018).10.1021/acs.nanolett.8b01692 ↗
40. Chakraborty, B. et al. Symmetry-dependent phonon renormalization in monolayer MoS2 transistor. Phys. Rev. B. 85, 161403 (2012).10.1103/PhysRevB.85.161403 ↗
41. Mouri, S., Miyauchi, Y. & Matsuda, K. Tunable photoluminescence of monolayer MoS2 via chemical doping. Nano Lett. 13, 5944–5948 (2013).10.1021/nl403036h ↗
42. Sangwan, V. K. et al. Gate-tunable memristive phenomena mediated by grain boundaries in single-layer MoS2. Nat. Nano 10, 403 (2015).10.1038/nnano.2015.56 ↗