journal article·2013-05

Characterization and Analysis of the Hysteresis in a ZnO Nanoparticle Thin-Film Transistor

F. F. Vidor, G. Wirth, F. Assion, K. Wolff, U. Hilleringmann

Publisher page

Abstract

During the past few decades, the interest in flexible and transparent electronics has arisen, and ZnO-based devices present a great potential among these technologies. In this study, ZnO nanoparticles were used to integrate thin-film transistors, whereas cross-linked poly(4-vinylphenol) (PVP) and PECVD-SiO 2 were used as a gate dielectric layer. Unfortunately, there are reliability concerns in ZnO devices, such as aging and hysteresis. In this study, an experimental investigation of the hysteresis in the transfer characteristic is performed. It was observed that the hysteresis direction is affected by temperature variation when the polymeric dielectric is used. The PVP bulk polarization, the traps in nanoparticles and at the polymeric dielectric interface, as well as the desorption of oxygen molecules in the surface of the nanoparticles, were attributed as the main cause of the hysteretic behavior.
Source: openalex_inverted_index · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Thin-Film Transistor Technologies · ZnO doping and properties · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (53)

Show source-provided references
1. 10.1016/S0925-4005(00)00381-610.1016/S0925-4005(00)00381-6 ↗
2. 10.1021/jp072999j10.1021/jp072999j ↗
3. 10.1021/ar00116a00110.1021/ar00116a001 ↗
4. 10.1063/1.283032910.1063/1.2830329 ↗
5. Comparative studies on the stability of polymer versus SiO2 gate dielectrics for pentacene thin-film transistors10.1063/1.2345243 ↗
6. 10.1063/1.292477210.1063/1.2924772 ↗
7. 10.1063/1.279447510.1063/1.2794475 ↗
8. 10.1002/pssa.20092546710.1002/pssa.200925467 ↗
9. 10.1063/1.234561210.1063/1.2345612 ↗
10. 10.1021/nl080370210.1021/nl0803702 ↗
11. 10.1063/1.211762910.1063/1.2117629 ↗
12. 10.1021/cm049598q10.1021/cm049598q ↗
13. 10.1063/1.219647510.1063/1.2196475 ↗
14. 10.1063/1.309775410.1063/1.3097754 ↗
15. 10.1016/j.spmi.2008.09.00210.1016/j.spmi.2008.09.002 ↗
16. 10.1149/1.361518310.1149/1.3615183 ↗
17. Integration von nanoskaligen feldeffekttransistoren mit zinkoxid-nanopartikeln auf glassubstrat
18. Characterisation of sub-100�nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique
19. 10.1109/ESSDERC.2009.533137310.1109/ESSDERC.2009.5331373 ↗
20. 10.1109/AFRCON.2011.607198310.1109/AFRCON.2011.6071983 ↗
21. 10.1063/1.273362610.1063/1.2733626 ↗
22. 10.1109/ESSDERC.2010.561838310.1109/ESSDERC.2010.5618383 ↗
23. 10.1109/TDMR.2008.91630710.1109/TDMR.2008.916307 ↗
24. 10.1016/j.tsf.2011.02.07310.1016/j.tsf.2011.02.073 ↗
25. 10.1021/ja808243k10.1021/ja808243k ↗
26. 10.1063/1.352418410.1063/1.3524184 ↗
27. 10.1166/jnn.2005.18210.1166/jnn.2005.182 ↗
28. 10.1088/0953-8984/16/25/R0110.1088/0953-8984/16/25/R01 ↗
29. 10.1021/jp991467310.1021/jp9914673 ↗
30. jagadish · Zinc Oxide Bulk Thin Film and Nanostructures Processing Properties and Applications · 2006
31. 10.1103/PhysRevLett.85.101210.1103/PhysRevLett.85.1012 ↗
32. 10.1103/PhysRevB.76.16520210.1103/PhysRevB.76.165202 ↗
33. 10.1021/nl051586w10.1021/nl051586w ↗
34. 10.1016/j.spmi.2007.04.03610.1016/j.spmi.2007.04.036 ↗
35. 10.1016/j.mee.2010.03.00910.1016/j.mee.2010.03.009 ↗
36. 10.1088/0957-4484/20/50/50520110.1088/0957-4484/20/50/505201 ↗
37. Advanced nanomaterials: Datasheet-AdNano zinc oxide
38. 10.1002/adma.20090044010.1002/adma.200900440 ↗
39. 10.1063/1.154267710.1063/1.1542677 ↗
40. 10.1016/j.sse.2011.01.04610.1016/j.sse.2011.01.046 ↗
41. 10.1063/1.297212110.1063/1.2972121 ↗
42. 10.1109/TED.2011.213814310.1109/TED.2011.2138143 ↗
43. 10.1007/BF0270676510.1007/BF02706765 ↗
44. 10.1002/adma.20080358410.1002/adma.200803584 ↗
45. wong · Flexible Electronics Materials and Applications · 200910.1007/978-0-387-74363-9 ↗
46. 10.1109/23.27353710.1109/23.273537 ↗
47. 10.1109/TNS.2003.81292710.1109/TNS.2003.812927 ↗
48. 10.1038/nature0693210.1038/nature06932 ↗
49. rhoderick · Metal-Semiconductor Contacts · 1988
50. 10.1063/1.36689210.1063/1.366892 ↗
51. 10.1109/IRPS.2010.548885610.1109/IRPS.2010.5488856 ↗
52. 10.1109/IEDM.2009.542430510.1109/IEDM.2009.5424305 ↗
53. 10.1016/j.physa.2005.11.01410.1016/j.physa.2005.11.014 ↗