Ferroelectrics at the nanoscale: materials and devices – a critical review
Source abstract
Abstract
Following the initial report on ferroelectricity in hafnia (HfO2) more than a decade ago, the researchers’ interest in this intriguing material system has constantly increased due to the promise it holds for future applications. Currently, there is an unbalanced situation, where an overwhelming majority of studies focus on either nanoscale characterization or on tuning the growth conditions in view of improving the properties of HfO2, but only few applications of this material system are being investigated. The goal of this review is to provide an overview of all emerging nanoscale ferroelectrics, to review their integration in most promising devices and to provide a critical analysis addressing the detrimental physical effects of nanoscale ferroelectrics on the performance of devices while outlining the perspectives to alleviate these adverse effects.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Ferroelectric and Negative Capacitance Devices · MXene and MAX Phase Materials · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Micromachined structures, microwave circuits and devices Laboratory (RF-MEMS) (L4), National Institute for Research and Development in Microtechnologies (IMT Bucharest), Voluntari (Ilfov), Romania
Research Centre for Nanotechnologies and Carbon-based Nanomaterials (CENASIC), National Institute for Research and Development in Microtechnologies (IMT Bucharest), Voluntari (Ilfov), Romania
Univ. of Bucharest, Physics Faculty, Bucharest, Romania
Academy of Romanian Scientists, Bucharest, Romania;
Tyndall National Institute-University College Cork, Cork, Ireland
Funding
Unitatea Executiva pentru Finantarea Invatamantului Superior, a Cercetarii, Dezvoltarii si Inovarii
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