High throughput method for K0.5Na0.5NbO3 thin films preparation by chemical solution deposition
Source abstract
Abstract
Abstract A high throughput method for synthesis and characterization of ferroelectric thin film libraries prepared by chemical solution deposition was developed. With a throughput of over 100 samples of different composition/day, it is possible to screen vast composition fields in a manageable amount of time. The method was applied to films of the binary KNbO3–NaNbO3 system. Structured Pt/SiO2/Si wafers were used as substrates. Samples of 450 nm thickness with remarkable dielectric properties and pure perovskite phases were obtained by optimizing the composition with respect to the K/Na-ratio, and by identifying the ideal amount of alkali-metal excess added to the precursor solutions.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Ferroelectric and Piezoelectric Materials · Electronic and Structural Properties of Oxides · Multiferroics and related materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (13)
Show source-provided references
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