journal article·1991-11-01

Correlation Between Electrical and Structural Characterization of In0.53Ga0.47As / Si3 N 4 Interfaces on MIS Structures

J. M. López‐Villegas, J. R. Morante, A. Cornet, M. Renaud, P. Boher

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Abstract

In this work a study of the slow states present in the interfaces on metal‐insulator‐semiconductor structures is carried out. A method to obtain the profiles of slow states in the insulator from electrical measurements performed under constant capacitance conditions is reported. These profiles have been correlated with the structural characterization of the interface performed in situ during the surface treatments.
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Research context

OpenAlex topics: Semiconductor materials and devices · Semiconductor materials and interfaces · Semiconductor Quantum Structures and Devices

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Affiliations

Càtedra d'Electrònica, Facultat de Física, Universitat de Barcelona, Barcelona E‐08028, Spain

Laboratoires d'Electronique Philips, BP 15‐94450, Limeil‐Brevannes, France

References

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