Chemical Solution Deposition of Silver Halide Films

Chemical solution deposition of semiconductor films has been confined almost entirely to chalcogenides. Here, we extend this technique to halide films. Silver halides (AgI, AgBr, and AgCl) were deposited using in-situ homogeneous hydrolysis of organic haloalcohols to form halide ions that react with silver ions in aqueous solution. Also, a rapid precipitation method is described that gives AgCl films. Structural (XRD), morphological (TEM), and optical (transmission spectra) characterizations of the films are presented. Some preliminary results and ideas on other halide films are presented.