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3. Eco-friendly, solution-processed In-W-O thin films and their applications in low-voltage, high-performance transistors
10.1039/C6TC00474A ↗4. Impact of the Cation Composition on the Electrical Performance of Solution-Processed Zinc Tin Oxide Thin-Film Transistors
10.1021/am503351e ↗5. Ultrathin Sticker-Type ZnO Thin Film Transistors Formed by Transfer Printing via Topological Confinement of Water-Soluble Sacrificial Polymer in Dimple Structure
10.1002/adfm.201202409 ↗6. Control of electrical properties and gate bias stress stability in solution-processed a-IZO TFTs by Zr doping
10.1016/j.cap.2014.10.018 ↗7. Synthesis and characterization of silanized-SiO2/povidone nanocomposite as a gate insulator: The influence of Si semiconductor film type on the interface traps by deconvolution of Si2s
10.1016/j.cap.2018.09.014 ↗8. Synthesis and Characterization of Cross-Linked Nanocomposite as a Gate Dielectric for p-Type Silicon Field-Effect Transistor
10.1007/s11664-018-6231-8 ↗9. Toward an Understanding of Thin-Film Transistor Performance in Solution-Processed Amorphous Zinc Tin Oxide (ZTO) Thin Films
10.1021/acsami.7b06203 ↗10. Wang, Z., Jeon, S.-H., Hwang, Y.-J., Lee, S.-H., Jang, J., Kang, I.M., Kim, D.-K., and Bae, J.-H. (2022). Physico-Chemical Origins of Electrical Characteristics and Instabilities in Solution-Processed ZnSnO Thin-Film Transistors. Coatings, 12.
10.3390/coatings12101534 ↗11. Solution-processed high stability top-gate W and F co-doped ZnSnO thin film transistors
10.1063/5.0137931 ↗16. Comparative Study of Antimony Doping Effects on the Performance of Solution-Processed ZIO and ZTO Field-Effect Transistors
10.1021/acsami.7b01090 ↗17. Characterization of dual-target co-sputtered novel Hf-doped ZnSnO semiconductors and the enhanced stability of its associated thin film transistors
10.1016/j.jallcom.2016.04.167 ↗18. Simultaneous enhancement of electrical performance and stability of zinc-tin-oxide thin-film transistors by tantalum doping
10.1016/j.tsf.2020.138135 ↗19. Role of dopants as a carrier suppressor and strong oxygen binder in amorphous indium-oxide-based field effect transistor
10.1557/jmr.2014.187 ↗20. Preparation and effects of post-annealing temperature on the electrical characteristics of Li–N co-doped ZnSnO thin film transistors
10.1016/j.ceramint.2016.12.145 ↗22. Multipurpose surface functionalization on AZ31 magnesium alloys by atomic layer deposition: Tailoring the corrosion resistance and electrical performance
10.1039/C7NR00127D ↗24. Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
10.1016/j.surfcoat.2016.08.023 ↗25. Design for improved adhesion of fluorine-incorporated hydrogenated amorphous carbon on metallic stent: Three-layered structure with controlled surface free energy
10.1016/j.diamond.2011.04.014 ↗26. Low-doping Effects of Nanostructure ZnO: Sn tin films annealed at different temperature in Nitrogen ambient to be applied as an Anti-reflecting coating (ARC)
10.3844/ajeassp.2010.171.179 ↗27. Facile and Environmentally Friendly Solution-Processed Aluminum Oxide Dielectric for Low-Temperature, High-Performance Oxide Thin-Film Transistors
10.1021/am508775c ↗28. Xu, H., Ding, X., Qi, J., Yang, X., and Zhang, J. (2021). A Study on Solution-Processed Y2O3 Films Modified by Atomic Layer Deposition Al2O3 as Dielectrics in ZnO Thin Film Transistor. Coatings, 11.
10.3390/coatings11080969 ↗29. Solution-Processed Yttrium-Doped IZTO Semiconductors for High-Stability Thin Film Transistor Applications
10.1109/TED.2019.2949702 ↗33. Effects of Nitrogen and Hydrogen Codoping on the Electrical Performance and Reliability of InGaZnO Thin-Film Transistors
10.1021/acsami.6b15275 ↗35. Solution-Processed Amorphous In–Zn–Sn Oxide Thin-Film Transistor Performance Improvement by Solution-Processed Y2O3 Passivation
10.1109/LED.2016.2528288 ↗37. High-Performamce Amorphous InGaZnO Thin-Film Transistor with ZrLaO Gate Dielectric Fabricated at Room Temperature