Design Method for Stress Reduction of Multilayer Thin Films
Source abstract
Abstract
Residual stress in optical thin films severely degrades optoelectronic device performance. Traditional designs, relying on extensive experiments, limit precise stress regulation. This study proposes a Stoney’s formula-based stress design method for multilayer thin films, constructing a mathematical model to characterize their total stress. Innovatively, it integrates single-layer stress and spectral performance for dual-objective optimization (stress elimination and spectral indicators), significantly reducing deposition workload. Experiments show small stress-prediction deviations in the 1.064 μm laser and 3.7–4.8 μm mid-infrared bands. A 16-layer broadband antireflection film (400–900 nm) with Ti2O3, HfO2, and SiO2 also shows effectively reduced stress. This model offers a novel, reliable scheme for precise residual stress regulation in multilayer thin films.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Semiconductor materials and devices · Advanced ceramic materials synthesis · Copper Interconnects and Reliability
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Xi’an Institute of Applied Optics, Xi’an 710065, China
Funding
Naval Systems Engineering Institute (China)
References (19)
Show source-provided references
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