The Etching Behaviour and Fluorine-Based-Plasma Resistance of YOF Coatings Deposited by Atmospheric Plasma Spraying
Source abstract
Abstract
There is a high demand for plasma-resistant coatings that prevent the corrosion of the internal ceramic components of plasma etching equipment, thereby reducing particle contamination and process drift. Yttrium oxyfluoride (YOF) coatings were prepared using atmospheric plasma spraying (APS) with commercially available YOF/YF3 powder mixtures; namely YOF 3%, YOF 6%, and YOF 9%. The etching behaviour of YOF and yttrium oxide (Y2O3) coatings was investigated using an inductively coupled plasma consisting of NF3/He. X-ray photoelectron spectroscopy (XPS) showed that the YOF 6% coating had the thickest fluorinated layer. The scanning electron microscope (SEM) examination revealed that the YOF 6% coating showed exceptional resistance to erosion and generated a reduced quantity of contaminated particles in comparison to Y2O3. Consequently, it is more suitable as a protective material for the inner wall of reactors. The YOF coatings exhibit excellent stability and high resistance to erosion, indicating their appropriateness for use in the semiconductor industry.
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Research context
OpenAlex topics: ZnO doping and properties · Plasma Diagnostics and Applications · Metal and Thin Film Mechanics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
School of Materials Science and Engineering, Shanghai University, 333 Nanchen Road, Shanghai 200444, China
Shanghai Huali Integrated Circuit Corporation, 6 Liangteng Road, Pudong New Area, Shanghai 201314, China
Chongqing Genori Technology Co., Ltd., No.66, Sendi Avenue, Xipeng Town, Jiulongpo District, Chongqing 401326, China
Shanghai Collaborative Innovation Center of Intelligent Sensing Chip Technology, Shanghai 201800, China
Zhejiang Institute of Advanced Materials, Shanghai University, Jiashan 314113, China
Funding
National Key R & D Program of China
References (32)
Show source-provided references
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