Simulation and Optimization of Film Thickness Uniformity in Physical Vapor Deposition
Source abstract
Abstract
Optimization of thin film uniformity is an important aspect for large-area coatings, particularly for optical coatings where error tolerances can be of the order of nanometers. Physical vapor deposition is a widely used technique for producing thin films. Applications include anti-reflection coatings, photovoltaics etc. This paper reviews the methods and simulations used for improving thin film uniformity in physical vapor deposition (both evaporation and sputtering), covering characteristic aspects of emission from material sources, projection/mask effects on film thickness distribution, as well as geometric and rotational influences from apparatus configurations. Following the review, a new program for modelling and simulating thin film uniformity for physical vapor deposition was developed using MathCAD. Results from the program were then compared with both known theoretical analytical equations of thickness distribution and experimental data, and found to be in good agreement. A mask for optimizing thin film thickness distribution designed using the program was shown to improve thickness uniformity from ±4% to ±0.56%.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Optical Coatings and Gratings · Surface Roughness and Optical Measurements · Advanced Surface Polishing Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
School of OptoElectronic Engineering, Changchun University of the Science and Technology, Changchun 130022, China
Institute of Thin Films, Sensors and Imaging, School of Engineering and Computing, University of the West of Scotland, Paisley PA1 2BE, UK
School of Material Science and Engineering, Chongqing University of Science and Technology, Chongqing 401331, China
References (58)
Show source-provided references
1. Gradient-index narrow-bandpass filter fabricated with glancing-angle deposition10.1364/OL.29.002545 ↗
2. Chu, H.O., Song, S., Li, C., and Gibson, D. (2017). Surface enhanced raman scattering substrates made by oblique angle deposition: methods and applications. Coatings, 7.10.3390/coatings7020026 ↗
3. Darband, G.B., Aliofkhazraei, M., Khorsand, S., Sokhanvar, S., and Kaboli, A. (2018). Science and engineering of superhydrophobic surfaces: Review of corrosion resistance, chemical and mechanical stability. Arabian J. Chem., in press.
4. Mattox, D.M. (2010). Handbook of Physical Vapor Deposition (PVD) Processing, William Andrew. [2nd ed.].10.1016/B978-0-8155-2037-5.00008-3 ↗
5. Hill, R.J. (1986). Physical Vapor Deposition, Temescal a Division of the BOC Group. [2nd ed.].
6. Mahan, J.E. (2000). Physical Vapor Deposition of Thin Films, Wiley-VCH. [1st ed.].
7. Physical vapor deposition (PVD) methods for synthesis of thin films: A comparative study
8. Technology and applications of broad-beam ion sources used in sputtering. Part I. Ion source technology10.1116/1.571819 ↗
9. Hans, J.G. (2016). Thin film deposition technologies and processing of biomaterials. Thin Film Coatings for Biomaterials and Biomedical Applications, Elsevier.
10. Mirrors used in the LIGO interferometers for first detection of gravitational waves10.1364/AO.56.000C11 ↗
11. Anti-reflective coatings: A critical, in-depth review10.1039/c1ee01297e ↗
12. Madsen, C.K., and Zhao, J.H. (1999). Optical Filter Design and Analysis: A Signal Processing Approach, John wiley & Sons. [1st ed.].10.1002/0471213756 ↗
13. Reliability of laser safety eye wear in the femtosecond regime10.1364/OPEX.12.001329 ↗
14. A coating thickness uniformity model for physical vapor-deposition systems: Overview10.1016/0257-8972(94)02298-5 ↗
15. Film thickness distribution control with off-axis circular magnetron sources onto rotating substrate holders: Comparison of computer simulation with practical results10.1116/1.576871 ↗
16. Expressions for the evaporation and condensation coefficients in the hertz-knudsen relation10.1021/acs.chemrev.5b00511 ↗
17. Optimization of deposition uniformity for large-aperture National Ignition Facility substrates in a planetary rotation system10.1364/AO.45.003097 ↗
18. Uniformity of film thickness on rotating planetary planar substrates10.1016/0040-6090(73)90203-4 ↗
19. Correcting diaphragms for improving the thickness uniformity of vacuum coatings
20. Optimization of thickness uniformity of optical coatings on a conical substrate in a planetary rotation system10.1364/AO.52.000B26 ↗
21. Thickness uniformity of films deposited on rotating substrates10.1364/JOT.76.000100 ↗
22. Modeling and validation of uniform large-area optical coating deposition on a rotating drum using microwave plasma reactive sputtering10.1364/AO.56.000C65 ↗
23. Film thickness distribution in magnetron sputtering10.1016/0042-207X(88)90465-4 ↗
24. A time-dependent model for reactive sputter deposition10.1088/0022-3727/47/23/235302 ↗
25. Correction masks for thickness uniformity in large-area thin films10.1364/AO.39.001602 ↗
26. Analysis of the thickness uniformity improved by using wire masks for coating optical bandpass filters10.1364/AO.53.001474 ↗
27. Holland, L. (1970). Vacuum Deposition of Thin Films, Chapman & Hall. [1st ed.].
28. Sree Harsha, K.S. (2005). Chapter 5: Thermal evaporation source. Principles of Vapor Deposition of Thin Films, Elsevier. [1st ed.].10.1016/B978-008044699-8/50005-X ↗
29. Schichtdickengleichmäßigkeit von aufgedampften schichten in theorie und praxis
30. Ohring, M. (2002). Materials Science of Thin Films: Deposition and Structure, Elsevier. [2nd ed.].10.1016/B978-012524975-1/50012-4 ↗
31. Pulker, H.K. (1999). Film thickness. Coatings on Glass, Elsevier. [1st ed.].10.1016/B978-044450103-5/50010-8 ↗
32. Monte Carlo simulation of vapor transport in physical vapor deposition of titanium10.1116/1.582274 ↗
33. Thickness distribution of evaporated films10.1117/12.20387 ↗
34. Sigmund, P. (1993). Fundamental Processes in Sputtering of Atoms and Molecules (SPUT92), Kongelige Danske videnskabernes selskab.
35. Seshan, K. (2001). Deposition technologies and applications: Introduction and overview. Handbook of Thin Film Deposition Processes and Techniques, Noyes Publications/William Andrew Publishing. [2nd ed.].
36. Monte Carlo simulation of ions in a magnetron plasma10.1109/27.106828 ↗
37. Analysis of magnetic field distribution in a cylindrical-type magnetron sputtering system10.1177/0954405413477854 ↗
38. Angular distribution of atoms during the magnetron sputtering of polycrystalline targets10.1134/S1063784212040196 ↗
39. Emission pattern of real vapor sources in high vacuum: An overview10.1364/AO.38.000695 ↗
40. Thickness uniformity control of sputtered film based on roll-to-roll system with a rectangular target
41. Thickness distribution of thin film deposited with magnetro-sputtering
42. On the thickness uniformity of films deposited by magnetron sputtering
43. Holland, L., Steckelmacher, W., and Yarwood, J. (1974). Vacuum Manual, Spon. [1st ed.].10.1007/978-94-011-8120-4 ↗
44. Macleod, H.A. (2010). Thin-Film Optical Filters, CRC Press/Taylor & Francis.10.1201/9781420073034 ↗
45. Tang, J.F., Gu, P.F., Liu, X., and Li, H.F. (2006). Modern Optical Thin Film Technology, Zhejiang University Press. [2nd ed.]. (In Chinese).
46. Theoretical calculation of thickness uniformity of optical thin films
47. The GEO 600 gravitational wave detector10.1088/0264-9381/19/7/321 ↗
48. Yang, B. (2009). Study On the Distribution of Magnetic Filed and Thin Film Thickness Uniformity of Magnetron Sputterings System. [Master’s Thesis, Xi’an University of Technology]. (In Chinese).
49. Ma, H.C. (2010). Uniformity Analysis of Substrate Film Thickness of Magnetron Sputtering Machine. [Master’s Thesis, Northeastern University]. (In Chinese).
50. Analysis of a planetary-rotation system for evaporated optical coatings10.1364/AO.55.008550 ↗
51. Study and analysis on the film uniformity
52. Tian, M.B., and Liu, D.L. (1991). Chapter 3: Optical properties of thin films. Handbook of Thin Film Science and Technology, Mechanical Industry Press. [1st ed.]. (In Chinese).
53. Deterministic control of thin film thickness in physical vapor deposition systems using a multi-aperture mask10.1364/OPEX.13.002731 ↗
54. Theoretical design of shadowing masks for uniform coatings on spherical substrates in planetary rotation systems10.1364/OE.20.023790 ↗
55. Depositing uniform-thickness coatings on large surfaces by means of electron-beam evaporation in vacuum10.1364/JOT.72.000799 ↗
56. Layer uniformity obtained by vacuum evaporation: Application to Fabry-Perot filters10.1364/AO.28.002960 ↗
57. Pulsed laser deposition of alumina and zirconia thin films on polymers and glass as optical and protective coatings10.1016/S0257-8972(99)00191-7 ↗
58. Analytical modeling and tolerance analysis of a linear variable filter for spectral order sorting10.1364/OE.23.005102 ↗