journal article·2022-09-27

Engineering the Surface Chemistry of Colloidal InP Quantum Dots for Charge Transport

Tianshuo Zhao, Qinghua Zhao, Jaeyoung Lee, Shengsong Yang, Han Wang, Ming-Yuan Chuang, Yulian He, Sarah M. Thompson, Guannan Liu, Nuri Oh, Christopher B. Murray, Cherie R. Kagan

Chemistry of Materials· Volume 34· Issue 18
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Abstract

Colloidal InP quantum dots (QDs) have emerged as potential candidates for constructing nontoxic QD-based optoelectronic devices. However, charge transport in InP QD thin-film assemblies has been limitedly explored. Herein, we report the synthesis of ∼8 nm edge length (∼6.5 nm in height), tetrahedral InP QDs and study charge transport in thin films using the platform of the field-effect transistor (FET). We design a hybrid ligand-exchange strategy that combines solution-based exchange with S2– and solid-state exchange with N3– to enhance interdot coupling and control the n-doping of InP QD films. Further modifying the QD surface with thin, thermally evaporated Se overlayers yields FETs with an average electron mobility of 0.45 cm2 V–1 s–1, ∼10 times that of previously reported devices, and a higher on–off current ratio of 103–104. Analytical measurements suggest lower trap-state densities and longer carrier lifetimes in the Se-modified InP QD films, giving rise to a four-time longer carrier diffusion length.
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Research context

OpenAlex topics: Quantum Dots Synthesis And Properties · Chalcogenide Semiconductor Thin Films · Nanowire Synthesis and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Materials Science and Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States

Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States

Department of Electrical and System Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States

Department of Chemical and Environmental Engineering, Yale University, New Haven, Connecticut 06520, United States

Funding

Samsung Advanced Institute of Technology · National Science Foundation

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