journal article·2018-06-12Open access

Atomic Layer Deposition of Molybdenum Oxides with Tunable Stoichiometry Enables Controllable Doping of MoS2

Michael J. Moody, Alex Henning, Titel Jurca, Ju Ying Shang, Hadallia Bergeron, Itamar Balla, Jack N. Olding, Emily A. Weiss, Mark C. Hersam, Tracy L. Lohr, Tobin J. Marks, Lincoln J. Lauhon

Chemistry of Materials· Volume 30· Issue 11

Abstract

A study demonstrates two new low-temperature atomic layer deposition (ALD) processes and use them to deposit molybdenum oxides with controlled molybdenum oxidation states. The optical bandgaps and resistivities increase with increasing oxygen content, following the same trends as crystalline molybdenum oxides. The study dopes MoS2 by depositing a MoOx overlayer and tune the threshold voltage shift in thin film transistors (TFTs) from positive (p-type) to negative (n-type) by tuning the oxide composition. Low hysteresis in sweeps of the transistor gate voltage, an absence of strain, and reversibility upon oxide etching together suggest that this process maintains the van der Waals interface without significant chemical changes, and should be applicable as a doping strategy for 2D systems.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Semiconductor materials and devices · Electronic and Structural Properties of Oxides · Electrocatalysts for Energy Conversion

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States

Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States

Graduate Program in Applied Physics, Northwestern University, Evanston, Illinois 60208, United States

Department of Medicine, Northwestern University, Evanston, Illinois 60208, United States

Department of Electrical Engineering and Computer Science, Northwestern University, Evanston, Illinois 60208, United States

Funding

Division of Emerging Frontiers in Research and Innovation · National Institute of Standards and Technology · Deutsche Forschungsgemeinschaft · Natural Sciences and Engineering Research Council of Canada · Northwestern University · National Science Foundation · Division of Materials Research · International Institute for Nanotechnology, Northwestern University

References (40)

Show source-provided references
1. 10.1021/nl400044m10.1021/nl400044m ↗
2. 10.1021/acs.chemmater.7b0199810.1021/acs.chemmater.7b01998 ↗
3. 10.1021/acs.nanolett.5b0031410.1021/acs.nanolett.5b00314 ↗
4. 10.1021/acs.nanolett.7b0132210.1021/acs.nanolett.7b01322 ↗
5. 10.1021/acsnano.7b0481310.1021/acsnano.7b04813 ↗
6. 10.1021/acsami.7b0053810.1021/acsami.7b00538 ↗
7. 10.1021/nl503229310.1021/nl5032293 ↗
8. 10.1002/adma.20140200810.1002/adma.201402008 ↗
9. 10.1038/ncomms748510.1038/ncomms7485 ↗
10. 10.1002/adfm.20160538010.1002/adfm.201605380 ↗
11. 10.1021/ja302690610.1021/ja3026906 ↗
12. 10.1002/anie.20161183810.1002/anie.201611838 ↗
13. 10.1021/cr900056b10.1021/cr900056b ↗
14. 10.1116/1.495953210.1116/1.4959532 ↗
15. 10.1021/acscatal.6b0171710.1021/acscatal.6b01717 ↗
16. 10.1039/C0JM01099E10.1039/C0JM01099E ↗
17. 10.1116/1.484359510.1116/1.4843595 ↗
18. 10.1116/1.493016110.1116/1.4930161 ↗
19. 10.1016/j.solmat.2011.12.00410.1016/j.solmat.2011.12.004 ↗
20. 10.1039/j1971000274110.1039/j19710002741 ↗
21. 10.1021/am401127s10.1021/am401127s ↗
22. 10.1002/pssb.1966015022410.1002/pssb.19660150224 ↗
23. 10.1002/pssb.20155200710.1002/pssb.201552007 ↗
24. 10.1021/ic50074a02910.1021/ic50074a029 ↗
25. 10.1016/0167-577X(94)90083-310.1016/0167-577X(94)90083-3 ↗
26. 10.1021/nl404389u10.1021/nl404389u ↗
27. 10.1016/0021-9517(87)90310-110.1016/0021-9517(87)90310-1 ↗
28. 10.1039/C4EE00890A10.1039/C4EE00890A ↗
29. 10.1016/j.molcata.2010.01.01810.1016/j.molcata.2010.01.018 ↗
30. 10.1021/nl404350510.1021/nl4043505 ↗
31. 10.1021/acsnano.6b0659210.1021/acsnano.6b06592 ↗
32. 10.1021/nn300167t10.1021/nn300167t ↗
33. 10.1063/1.370359510.1063/1.3703595 ↗
34. 10.1021/nn404775u10.1021/nn404775u ↗
35. 10.1021/am503210510.1021/am5032105 ↗
36. 10.1021/acsnano.5b0639810.1021/acsnano.5b06398 ↗
37. 10.1103/PhysRevB.85.16140310.1103/PhysRevB.85.161403 ↗
38. 10.1021/nn402483410.1021/nn4024834 ↗
39. 10.1002/adma.20160196610.1002/adma.201601966 ↗
40. 10.1038/nmat413510.1038/nmat4135 ↗