journal article·2017-03-14Open access

Chemical Vapor-Deposited Hexagonal Boron Nitride as a Scalable Template for High-Performance Organic Field-Effect Transistors

Tae Hoon Lee, Kwanpyo Kim, Gwangwoo Kim, Hyo Ju Park, Declan Scullion, Leo Shaw, Myung-Gil Kim, Xiaodan Gu, Won-Gyu Bae, Elton J. G. Santos, Zonghoon Lee, Hyeon Suk Shin, Yoshio Nishi, Zhenan Bao

Chemistry of Materials· Volume 29· Issue 5

Abstract

Organic field-effect transistors have attracted much attention because of their potential use in low-cost, large-area, flexible electronics. High-performance organic transistors require a low density of grain boundaries in their organic films and a decrease in the charge trap density at the semiconductor–dielectric interface for efficient charge transport. In this respect, the role of the dielectric material is crucial because it primarily determines the growth of the film and the interfacial trap density. Here, we demonstrate the use of chemical vapor-deposited hexagonal boron nitride (CVD h-BN) as a scalable growth template/dielectric for high-performance organic field-effect transistors. The field-effect transistors based on C 60 films grown on single-layer CVD h-BN exhibit an average mobility of 1.7 cm 2 V –1 s –1 and a maximal mobility of 2.9 cm 2 V –1 s –1 with on/off ratios of 10 7 . The structural and morphology analysis shows that the epitaxial, two-dimensional growth of C 60 on CVD h-BN is mainly responsible for the superior charge transport behavior. We believe that CVD h-BN can serve as a growth template for various organic semiconductors, allowing the development of large-area, high-performance flexible electronics.
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Research context

OpenAlex topics: Graphene research and applications · Semiconductor materials and devices · Diamond and Carbon-based Materials Research

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Affiliations

Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States

Department of Electrical Engineering, Kwangwoon University, Seoul 139-701, Korea

Department of Chemical Engineering, Stanford University, Stanford, California 94305, United States

Department of Physics, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Korea

Department of Energy Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Korea

School of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Korea

School of Mathematics and Physics, Queen’s University Belfast, Belfast BT71NN, United Kingdom

Department of Chemistry, Chung-Ang University, Seoul 06974, Korea

Stanford Synchrotron Radiation Light Source, SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States

School of Chemistry and Chemical Engineering, Queen’s University Belfast, Belfast BT95AL, United Kingdom

Department of Chemistry, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Korea

Funding

Engineering and Physical Sciences Research Council · Kwangwoon University · Ulsan National Institute of Science and Technology · National Research Foundation of Korea · Stanford University · U.S. Department of Energy · Queen's University Belfast

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