journal article·1985-12

High-rate deposition of a-Si:H using electron cyclotron resonance plasma

Seiichi Kato, Takeshi Aoki

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies

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References (7)

Show source-provided references
1. Knights · Appl. Phys. Lett. · 1981 · 38 · 33110.1063/1.92359 ↗
2. Hamasaki · Appl. Phys. Lett. · 1984 · 44 · 60010.1063/1.94841 ↗
3. McKenzie · J. Appl. Phys. · 1984 · 56 · 235610.1063/1.334274 ↗
4. Scott · Appl. Phys. Lett. · 1980 · 37 · 72510.1063/1.92059 ↗
5. Ogawa · Japan. J. appl. Phys. · 1981 · 20 · L63910.1143/JJAP.20.L639 ↗
6. Mejia · J. Non-Cryst. Solids · 1983 · 59&60 · 72710.1016/0022-3093(83)90274-0 ↗
7. Vanier · J. Appl. Phys. · 1984 · 56 · 181210.1063/1.334191 ↗