journal article·1989-12

Nature of AX center in amorphous silicon/nitride multilayers

Kunji Chen, Guomin Mao, Zhifeng Li, Hong Chen, Zhuoyun Ge, Hellmut Fritzsche

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Semiconductor materials and devices · Integrated Circuits and Semiconductor Failure Analysis

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References (8)

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3. Chen · Bull. Am. Phys. Soc. · 1986 · 31 · 333
4. Hundhausen · Phys. Rev. · 1985 · B32 · 665510.1103/PhysRevB.32.6655 ↗
5. Chen · J. Non-Cryst. Solids · 1987 · 90 · 42510.1016/S0022-3093(87)80455-6 ↗
6. Chen · J. Non-Cryst. Solids · 1983 · 59/60 · 44110.1016/0022-3093(83)90615-4 ↗
7. Tsai · J. Non-Cryst. Solids · 1985 · 77/78 · 99510.1016/0022-3093(85)90828-2 ↗
8. Roxlo · Phys. Rev. Lett. · 1984 · 52 · 199410.1103/PhysRevLett.52.1994 ↗