High rate deposition of SiO2 on large-scale glass by dc arc plasma enhanced CVD
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Abstract
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Research context
OpenAlex topics: Ga2O3 and related materials · ZnO doping and properties · Semiconductor materials and devices
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References (9)
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2. McBride · 1990 · 250
3. Uramoto · 1980 · IPPJ-453
4. Uramoto · Shinku · 1982 · 25 · 71910.3131/jvsj.25.719 ↗
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6. Adams · Solid State Technol. · 1983 · 135
7. Tsu · J. Vac. Sci. Technol. · 1989 · A7 · 111510.1116/1.576239 ↗
8. Banerjee · J. Vac. Sci. Technol. · 1992 · A10 · 339510.1116/1.577790 ↗
9. Dayton · 1957 · 5