Acid etching and silica coating effects on Y-TZP topography and ceramic/resin cement bond strength

Abstract Zirconia-based (Y-TZP) dental prostheses' retention loss remains one of the most frequently reported difficulties in dental practice. Selective Infiltration Etching (SIE) treatment has been proposed to alter the final Y-TZP topography improving its bond strength to resin cement. SIE consists of glass film deposition on the Y-TZP surface before glass removal with 10% hydrofluoric acid etching. This study's objective was to investigate the effects of SIE protocol steps on Y-TZP topography and its consequence on its bond strength to resin cement. The SIE protocol was divided into two main steps: silica coating (first step) and glass dissolution by hydrofluoric acid (second step), and the null hypothesis was that the SIE treatment has the same bond quality independently of the HF exposition time. Atomic Force Microscopy (AFM), Scanning Electron and Transmission Electron microscopy were used to characterize the zirconia surfaces. The bond strength was evaluated by the interfacial fracture toughness test, and data were analyzed by ANOVA and Tukey's Test (5%). As the main result, it was shown that, when exposed during sufficient time, the 10% HF can etch zirconia at room temperature, which is responsible for topographic changes, significantly improving the bond quality. Additionally, no glass components or dihedral angles modifications were observed at Y-TZP grain boundaries after silica coating. With the study limitations, it was possible to infer that the surface-modifying agent in SIE protocol is the HF etching, and the null hypothesis was rejected.