Characterizations and Process Parameters of Titanium Dioxide Thin Film by RF Sputtering
Source abstract
Abstract
In this study, we successfully combined RF magnetron sputtering of a pure Ti metal target and one-stage oxidation process with a wider oxygen ratio (10%-90%) and total sputtering flow rate (16-24 sccm) to produce TiO2thin films on a glass substrate. The crystallization, morphology, roughness, and thickness of the thin films were examined using XRD, HR-FESEM, AFM, and a profilometer. Subsequently, the photocatalytic performance was examined using a spectrometer and video tensiometer. The experimental results show that the TiO2thin films with a majority of anatase and higher roughness exhibit superior photocatalytic performance; the total sputtering gas flow rate of 18 sccm and oxygen content at 10% is the optimal option. Finally, an empirical formula to correlate the film thickness with deposition time was conducted for the sputtering flow rate of 18 sccm and the oxygen content of 10%.
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Research context
OpenAlex topics: TiO2 Photocatalysis and Solar Cells · Advanced Photocatalysis Techniques · ZnO doping and properties
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
National Taiwan Normal University
Industrial Technology Research Institute (DTC/ITRI)
References (38)
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1. M.R. Hoffmann, S.T. Martin, W. Choi, D.W. Bahenemann, Environmental application of semiconductor photocatalysis, Chem. Rev. 95 (1995) 69–96.10.1021/cr00033a004 ↗
2. J.C. Yu, J. Yu, W. Ho, J. Zhao, Light-induced super-hydrophilicity and photocatalytic activity of mesoporous TiO2 thin films, J. Photochem. Photobiol. A: Chem. 148 (2002) 331–339.10.1016/s1010-6030(02)00060-6 ↗
3. O. Carp, C.L. Huisman, A. Reller, Photoinduced reactivity of titanium oxide photoinduced reactivity of titanium oxide, Prog. Solid State Chem. 32 (2004) 33–177.10.1016/j.progsolidstchem.2004.08.001 ↗
4. S. Suárez, N. Arconada, Y. Castro, J.M. Coronado, R. Portela, A. Durán, B. Sánchez, Photocatalytic degradation of TCE in dry and wet air conditions with TiO2 porous thin films, Appl. Catal. B-Environ. 108– 109 (2011) 14– 21.10.1016/j.apcatb.2011.07.027 ↗
5. P. Evans, D.W. Sheel, Photoactive and antibacterial TiO2 thin films on stainless steel, Surf. Coat. Technol. 201 (2007) 9319–9324.10.1016/j.surfcoat.2007.04.013 ↗
6. S.H. Zhang, B.F. Hu, B. Xie, S.Y. Zhang, F.Y. Li, Preparation of titania film by pyrolysis of chelated tetrabutyl titanate, Key Eng. Mater. 368–372 (2008) 1468–1470.10.4028/www.scientific.net/kem.368-372.1468 ↗
7. T.P. Teng, T.C. Teng, C.C. Chen, The Fabrication of Nanophotocatalytic Film with Aqueous Titania Nanofluid by Electrophoretic Deposition, J. Nano Res. 10 (2010) 105-112.10.4028/www.scientific.net/jnanor.10.105 ↗
8. H. Ohsaki, Y. Tachibana, A. Hayashi, A. Mitsui, Y. Hayashi, High rate sputter deposition of TiO2 from TiO2-x target, Thin Solid Films 351 (1999) 57–60.10.1016/s0040-6090(99)00207-2 ↗
9. M. Yamagishia, S. Kurikib, P.K. Songa, Y. Shigesatoa, Thin film TiO2 photocatalyst deposited by reactive magnetron sputtering, Thin Solid Films 442 (2003) 227–231.10.1016/s0040-6090(03)00987-8 ↗
10. R. Dannenberg, P. Greene, Reactive sputter deposition of titanium dioxide, Thin Solid Films 360 (2000) 122–127.10.1016/s0040-6090(99)00938-4 ↗
11. H. Toku, R.S. Pessoa, H.S. Maciel, M. Massi, U.A. Mengui, The effect of oxygen concentration on the low temperature deposition of TiO2 thin films, Surf. Coat. Technol. 202 (2008) 2126–2131.10.1016/j.surfcoat.2007.08.075 ↗
12. J. Xiong, S.N. Das, S. Kim, J. Lim, H. Choi, J.M. Myoung, Photo-induced hydrophilic properties of reactive RF magnetron sputtered TiO2 thin films, Surf. Coat. Technol. 204 (2010) 3436–3442.10.1016/j.surfcoat.2010.04.001 ↗
13. B.X. Zhao, J.C. Zhou, L.Y. Rong, Microstructure and optical properties of TiO2 thin films deposited at different oxygen flow rates, Trans. Nonferrous Met. Soc. China 20 (2010) 1429–1433.10.1016/s1003-6326(09)60316-2 ↗
14. P.K. Song, Y. Irie, Y. Shigesato, Crystallinity and photocatalytic activity of TiO2 films deposited by reactive sputtering with radio frequency substrate bias, Thin Solid Films 496 (2006) 121–125.10.1016/j.tsf.2005.08.249 ↗
15. L. Chen, M.E. Graham, G. Li, K.A. Gray, Fabricating highly active mixed phase TiO2 photocatalysts by reactive DC magnetron sputter deposition, Thin Solid Films 515 (2006) 1176–1181.10.1016/j.tsf.2006.07.094 ↗
16. K. Okimura, A. Shibata, N. Maeda, K. Tachibana, Preparation of Rutile TiO2 Films by RF Magnetron Sputtering, Jpn. J. Appl. Phys. 34 (1995) 4950–4955.10.1143/jjap.34.4950 ↗
17. S. Ohno, D. Sato, M. Kona, P.K. Song, M. Yoshikawa, K. Suzuki, P. Frach, Y. Shigesato, Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films, Thin Solid Films 445 (2003).10.1016/s0040-6090(03)01152-0 ↗
18. I. Turkevych, Y. Pihosh, M. Goto, A. Kasahara, M. Tosa, S. Kato, K. Takehana, T. Takamasu, G. Kido, N. Koguchi, Photocatalytic properties of titanium dioxide sputtered on a nanostructured substrate, Thin Solid Films 516 (2008) 2387–2391.10.1016/j.tsf.2007.04.083 ↗
19. C.C. Chen, W.J. Yang, C.Y. Hsu, Investigation into the effects of deposition parameters on TiO2 photocatalyst thin films by rf magnetron sputtering, Superlattices Microstruct. 46 (2009) 461–468.10.1016/j.spmi.2009.05.007 ↗
20. O. Treichel, V. Kirchhoff, The influence of pulsed magnetron sputtering on topography and crystallinity of TiO2 films on glass, Surf. Coat. Technol. 123 (2000) 268–272.10.1016/s0257-8972(99)00522-8 ↗
21. K. Eufinger, D. Poelman, H. Poelman, R.D. Gryse, G.B. Marin, Photocatalytic activity of dc magnetron sputter deposited amorphous TiO2 thin films, Appl. Surf. Sci. 254 (2007) 148–152.10.1016/j.apsusc.2007.07.009 ↗
22. A. Fujishima, K. Hashimoto, T. Watanabe, TiO2 photocatalysis, Fundamentals and applications, 1st ed. BKC, Tokyo, (1999).
23. D. Mardare, G.I. Rusu, The inf luence of heat treatment on the optical properties of titanium oxide thin films, Mater. Lett. 56 (2002) 210–214.10.1016/s0167-577x(02)00441-x ↗
24. B. Xia , H. Huang, Y. Xie, Heat treatment on TiO2 nanoparticles prepared by vapor-phase hydrolysis, Mater. Sci. Eng. B-Adv. Funct. Solid-State Mater. 57 (1999) 150–154.10.1016/s0921-5107(98)00322-5 ↗
25. X. Deng, Y. Yue, Z. Gao, Gas-phase photo-oxidation of organic compounds over nanosized TiO2 photocatalysts by various preparations, Appl. Catal. B-Environ. 39 (2002) 135–147.10.1016/s0926-3373(02)00080-2 ↗
26. R.R. Bacsa, J. Kiwi, Effect of rutile phase on the photocatalytic properties of nanocrystalline titania during the degradation of p-coumaric acid, Appl. Catal. B-Environ. 16 (1998) 19–29.10.1016/s0926-3373(97)00058-1 ↗
27. D.S. Muggli, L. Ding, Photocatalytic performance of sulfated TiO2 and Degussa P25 TiO2 during oxidation of organics, Appl. Catal. B-Environ. 32 (2001) 181–194.10.1016/s0926-3373(01)00137-0 ↗
28. T. Ohno, K. Sarukawa, K. Tokieda, M. Matsumura1, Morphology of a TiO2 Photocatalyst (Degussa, P-25) Consisting of Anatase and Rutile Crystalline Phases, J. Catal. 203 (2001) 82–86.10.1006/jcat.2001.3316 ↗
29. A.R. Khataee, H. Aleboyeh, A. Aleboyeh, Crystallite phase-controlled preparation, characterisation and photocatalytic properties of titanium dioxide nanoparticles, J. Exp. Nanosci. 4, no. 2 (2009) 121-137.10.1080/17458080902929945 ↗
30. Q. Li, D. Sun, H. Kim, Fabrication of porous TiO2 nanofiber and its photocatalytic activity, Mater. Res. Bull. 46 (2011) 2094–(2099).
31. S.K. Zheng, G. Xiang, T.M. Wang, F. Pan, C. Wang, W.C. Hao, Photocatalytic activity studies of TiO2 thin films prepared by r. f. magnetron reactive sputtering, Vacuum 72 (2003) 79–84.10.1016/s0042-207x(03)00104-0 ↗
32. F. Lapostolle, A. Billard, J. von Stebut, Structure/mechanical properties relationship of titanium-oxygen coatings reactively sputter-deposited, Surf. Coat. Technol. 135 (2000) 1–7.10.1016/s0257-8972(00)00721-0 ↗
33. JCPDS-ICDD, The International Centre for Diffraction Data, PCPDFWIN 2. 4, (2003).
34. C.H. Chen, E.M. Kelder, Electrostatic sol-spray deposition (ESSD) and characterisation of nanostructured TiO2 thin films, Thin Solid Films 342 (1999) 35–41.10.1016/s0040-6090(98)01160-2 ↗
35. T. Sakai, Y. Kuniyoshi, W. Aoki, S. Ezoe, T. Endo, Y. Hoshi, High-rate deposition of photocatalytic TiO2 films by oxygen plasma assist reactive evaporation method, Thin Solid Films 516 (2008) 5860–5863.10.1016/j.tsf.2007.10.039 ↗
36. Y. Xu, M. Shen, Fabrication of anatase-type TiO2 films by reactive pulsed laser deposition for photocatalyst application, J. Mater. Process. Technol. 202 (2008) 301–306.10.1016/j.jmatprotec.2007.09.015 ↗
37. T.S. Yang, C. B Shiu, M.S. Wong, Structure and hydrophilicity of titanium oxide films prepared by electron beam evaporation, Surf. Sci. 548 (2004) 75–82.10.1016/j.susc.2003.10.044 ↗
38. A.G. Spencer, R.P. Howson, R. W. Lewin, Pressure stability in reactive magnetron sputtering, Thin Solid Films 158 (1988) 141–149.10.1016/0040-6090(88)90310-0 ↗