Wettability and infiltration of Si drop on silica substrate containing α-Si3N4 coating: Influence of oxygen content in α-Si3N4 coating
Source abstract
Abstract
Abstract The preparation of solar grade silicon (Si) is popularly carried out in silica (SiO2) crucible containing porous α-Si3N4 coating, in which poorly wetting SiO2 film around α-Si3N4 particles act as barrier for Si infiltration. The present investigation studies the influence of oxygen (O) content in coating on wettability and infiltration for Si/α-Si3N4/SiO2 ternary system. The amorphous SiO2 film surrounding Si3N4 particles is firstly synthesized by pre-oxidizing coating in air, and the O content is controlled by adjusting pre-oxidizing temperature and holding time. In this work, dynamic wetting behavior of Si drop on coating containing various content of O is investigated using the sessile drop method. Meanwhile, via microstructural analysis, infiltration under the drop and infiltration beyond the drop (including infiltration on coating surface and under coating surface) are distinguished on coatings with different O content. Finally, wettability transformation (from wetting to non-wetting) is analyzed; mechanism of infiltration resistance for O in coating is interpreted by analytical model.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Advanced ceramic materials synthesis · Advanced Surface Polishing Techniques · Surface Modification and Superhydrophobicity
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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