journal article·2017-06

Sintering, microstructure and electricity properties of ITO targets with Bi 2 O 3 –Nb 2 O 5 addition

Fei Liang, Jiaxiang Liu

Ceramics International· Volume 43· Issue 8
Publisher page

Abstract

Abstract High density and low electrical resistivity ITO targets were prepared by normal pressure sintering in oxygen with Bi 2 O 3 –Nb 2 O 5 addition. The relative density, microstructure and electrical properties of the ITO targets can be adjusted by changing the sintering temperature (1350 °C~1550 °C) and the content of Bi 2 O 3 –Nb 2 O 5 . The results show that the sintering temperature of ITO targets with Bi 2 O 3 –Nb 2 O 5 decreased from 1550 °C to 1450 °C, and the maximum relative density (99.6%) and the lowest electrical resistivity (1.78×10 −4 Ω cm) were reached when the sintering temperature was 1450 °C with 5 wt% Bi 2 O 3 –Nb 2 O 5 . The carrier concentration increased as the increase of the contents of Bi 2 O 3 –Nb 2 O 5 and sintering temperature. The mobility first increased, and then decreased above 1450 °C as the sintering temperature increased.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Nuclear Materials and Properties · High-pressure geophysics and materials · Nuclear Physics and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (37)

Show source-provided references
1. Effect of iron doping on structural, optical and electrical properties of sprayed In2O3 thin films10.1016/j.spmi.2015.01.015 ↗
2. Large optical nonlinearity of indium tin oxide in its epsilon-near-zero region10.1126/science.aae0330 ↗
3. Structural and electrical properties of sputtering power and gas pressure on Ti-dope In2O3 transparent conductive films by RF magnetron sputtering10.1016/j.apsusc.2012.12.133 ↗
4. A simple annealing process to obtain highly transparent and conductive indium doped tin oxide for dye-sensitized solar cells10.1016/j.ceramint.2013.09.086 ↗
5. Effects of an additional magnetic field in ITO thin film deposition by magnetron sputtering10.1016/j.ceramint.2014.08.111 ↗
6. Fabrication of low-porosity indium tin oxide ceramics in air from hydrothermally prepared powder10.1111/j.1151-2916.2001.tb00645.x ↗
7. Preparation and sintering behavior of the tin-doped indium oxide nanopowders10.1111/j.1551-2916.2010.03851.x ↗
8. Grain size control in ITO targets and its effect on electrical and optical properties of deposited ITO films10.1007/s10854-013-1633-0 ↗
9. K. Nakajima, N. Sato, U.S. Patent US5094787, 1992.
10. Sintering study of ITO using a ZnO-doped and microwave hybrid sintering approach
11. Sintering of tin-doped indium oxide with Bi2O3 additive10.1023/A:1004420416545 ↗
12. Buffer and anode-integrated WO3-doped In2O3 electrodes for PEDOT: pss-free organic photovoltaics10.1016/j.orgel.2013.02.025 ↗
13. Near infra-red transparent Mo-doped In2O3 by hetero targets sputtering for phosphorescent organic light emitting diodes10.1016/j.orgel.2012.12.036 ↗
14. Microwave hybrid fast sintering of porcelain bodies10.1016/j.jmatprotec.2007.02.041 ↗
15. Preparation and characteristics of Nb-doped indium tin oxide thin films by RF magnetron sputtering10.1007/s11801-012-2321-7 ↗
16. Electrical properties of the α, β, γ and δ phases of bismuth sesquioxide10.1016/0022-4596(78)90161-5 ↗
17. Modelling, refinement and analysis of the “Type III” δ-Bi2O3-related superstructure in the Bi2O3–Nb2O5 system10.1016/j.jssc.2004.01.003 ↗
18. The new oxygen-deficient fluorite Bi3NbO7: synthesis, electrical behavior and structural approach10.1016/S0025-5408(97)00190-6 ↗
19. The order–disorder transition in Bi2O3–Nb2O5 fluorite-like dielectrics10.1016/j.jeurceramsoc.2005.03.150 ↗
20. Oxide ion conductors based on bismuthsesquioxide10.1016/0025-5408(78)90138-1 ↗
21. An electron diffraction study of the type II Bi2−xNbxO3+x solid solution10.1016/0022-4596(95)80046-R ↗
22. A review of bismuth-rich binary oxides in the systems Bi2O3–Nb2O5, Bi2O3–Ta2O5, Bi2O3–MoO3, and Bi2O3–WO310.1006/jssc.1997.7677 ↗
23. Synthesis and characterization of indium niobium oxide thin films via sol–gel spin coating method10.1016/j.jmst.2013.06.012 ↗
24. WinPLOTR, a window tool for powder diffraction pattern analysis10.4028/www.scientific.net/MSF.378-381.118 ↗
25. Refinement of crystal structure of In2O3 at 2 wavelengths10.1107/S0365110X66001749 ↗
26. Average grain size in polycrystalline ceramics10.1111/j.1151-2916.1969.tb11975.x ↗
27. Determination of the solubility of tin in indium oxide using in situ and ex situ x-ray diffraction10.1111/j.1551-2916.2011.04999.x ↗
28. Dielectric properties of the fluorite-like Bi2O3–Nb2O5 solid solution and the tetragonal Bi3NbO710.1111/j.1151-2916.2003.tb03401.x ↗
29. Indium oxide co-doped with tin and zinc: a simple route to highly conducting high density targets for TCO thin-film fabrication10.1016/j.solidstatesciences.2012.04.021 ↗
30. Preparation of fluorine-containing indium tin oxide sputtering targets using spark plasma sintering process10.1111/j.1551-2916.2008.02503.x ↗
31. J. Xu, L. Yang, H. Wang, G. Zhu, H. Xu, C. Zhou, C. Yuan, Z. Yang, Sintering Behavior and Refining Grains of High Density Tin Doped Indium Oxide Targets with Low Tin Oxide Content, vol. 27, 2016, pp. 3298–3304.10.1007/s10854-015-4158-x ↗
32. Effect of substrate temperature on opto-electrical properties of Nb-doped In2O3 thin films10.1016/j.jcrysgro.2008.07.043 ↗
33. Electrical, optical, and structural properties of indium–tin–oxide thin films for organic light-emitting devices10.1063/1.371708 ↗
34. Optical, structural and electrical properties of tin doped indium oxide thin films prepared by spray-pyrolysis technique10.1088/0268-1242/15/7/305 ↗
35. Theory of photoconductivity in semiconductor films10.1103/PhysRev.104.1508 ↗
36. Electrical properties of heteroepitaxial grown tin-doped indium oxide films10.1063/1.362910 ↗
37. Investigation of morphological and electrical characteristics of tin doped indium oxide layers produced by a quasi single source precursor system10.1016/j.tsf.2012.09.063 ↗