journal article·2025-07-15

Multi-scale adaptive attention network with SE-enhanced ResNet34 for lithography hotspot detection

Hui Xu, Jiale Li, Yu Zhang, Xia Sun, Yong Xue, Zihao Li, Ruijun Ma, Zhengfeng Huang

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Abstract

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Research context

OpenAlex topics: Advancements in Photolithography Techniques · Image Processing Techniques and Applications · Industrial Vision Systems and Defect Detection

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Affiliations

Anhui University of Science and Technology, School of Computer Science and Engineering, Huainan, China

Anhui University of Science and Technology, School of Mathematics and Big Data, Huainan, China

Hefei University of Technology, School of Microelectronics, Hefei, China

Funding

National Natural Science Foundation of China

References

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