Influence of substrate temperature and bias voltage on the properties of magnetron sputtered TiBx films
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and devices · Diamond and Carbon-based Materials Research
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (57)
Show source-provided references
1. Physical-mechanical and physical-chemical properties of thin nanostructured boride-nitride films10.1016/S0257-8972(01)01246-4 ↗
2. Nanostructured titanium, zirconium and hafnium diborides: the synthesis, properties, size effects and stability10.1070/RCR4469 ↗
3. Evaluation of magnetron-sputtered TiB2 intended for tribological applications//surf10.1016/S0257-8972(99)00638-6 ↗
4. Low temperature deposited titanium boride thin films and their application to surface engineering of microscale mold inserts10.1007/s00542-012-1465-5 ↗
5. Mechanical and deformation behaviour of titanium diboride thin films deposited by magnetron sputtering10.1016/j.tsf.2008.12.028 ↗
6. The influence of pressure and magnetic field on the deposition of epitaxial TiBx thin films from DC magnetron sputtering10.1016/j.vacuum.2020.109355 ↗
7. A. czyrska-filemonowicz/nanohardness and tribological properties of nc-TiB2 coatings10.1016/j.jeurceramsoc.2013.02.024 ↗
8. The influence of low-energy ion bombardment on the microstructure development and mechanical properties of TiBx coatings10.1016/j.vacuum.2010.12.011 ↗
9. Low-stress superhard Ti-B films prepared by magnetron sputtering//surf10.1016/S0257-8972(03)00425-0 ↗
10. P. Kúš/mechanical properties of superhard TiB2 coatings prepared by DC magnetron sputtering10.1016/j.vacuum.2007.07.036 ↗
11. Vacuum arc plasma generation and thin film deposition from a TiB2 cathode10.1063/1.4935152 ↗
12. Facilitating TiB2 for filtered vacuum cathodic arc evaporation10.3390/coatings10030244 ↗
13. Vacuum arc plasma generation and thin film deposition from a TiB2 cathode10.1063/1.4935152 ↗
14. Influence of pulse frequency and bias on microstructure and mechanical properties of TiB2 coatings deposited by high power impulse magnetron sputtering10.1016/j.surfcoat.2016.06.086 ↗
15. Influence of the carbon incorporation on the mechanical properties of TiB2 thin films prepared by HiPIMS10.1016/j.ijrmhm.2022.105884 ↗
16. Improved oxidation properties from a reduced B content in sputter-deposited TiBx thin films//surf10.1016/j.surfcoat.2021.127353 ↗
17. Review of transition-metal diboride thin films10.1016/j.vacuum.2021.110567 ↗
18. C. Mitterer/experiment and simulation of the compositional evolution of Ti–B thin films deposited by sputtering of a compound target10.1063/1.2978211 ↗
19. Influence of negative bias voltage and deposition temperature on microstructure and properties of superhard TiB2 coatings deposited by high power impulse magnetron sputtering10.1016/j.surfcoat.2014.05.023 ↗
20. Controlling the boron-to-titanium ratio in magnetron-sputter-deposited TiBx thin films10.1116/1.4982649 ↗
21. Controlling the B/Ti ratio of TiBx thin films grown by high-power impulse magnetron sputtering10.1116/1.5026445 ↗
22. High-power impulse magnetron sputter deposition of TiBx thin films: effects of pressure and growth temperature10.1016/j.vacuum.2019.108884 ↗
23. I. Petrov/Self-organized nanocolumnar structure in superhard TiB2 thin films//appl
24. Microstructure and materials properties of understoichiometric TiBx thin films grown by HiPIMS//surf10.1016/j.surfcoat.2020.126537 ↗
25. High-power impulse magnetron sputter deposition of TiBx thin films: effects of pulse length and peak current density10.1016/j.vacuum.2024.113070 ↗
26. J. Michler/Microstructure-driven strengthening of TiB2 coatings deposited by pulsed magnetron sputtering10.1016/j.surfcoat.2019.04.042 ↗
27. 1994
28. Corrosion and micro-abrasion properties of an AISI 316L austenitic stainless steel after low-temperature plasma nitriding10.3390/coatings13111854 ↗
29. Ion current density on the substrate during short-pulse HiPIMS10.1088/1361-6595/acdd95 ↗
30. Target material pathways model for high power pulsed magnetron sputtering10.1116/1.1865133 ↗
31. Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields10.1088/0963-0252/21/2/025005 ↗
32. H. Ahn, D. Lee, Y. Um, Substrate temperature effects on DC sputtered Mo thin film, Appl. Sci. Converg. Technol. 26(1), 11‒15 (2017). https://doi.org/10.5757/ASCT.2017.26.1.11.10.5757/ASCT.2017.26.1.11 ↗
33. N.H. Mahzan, S.B. Hashim, S.H. Herman, U. Mohd Noor, M. Rusop, Deposition temperature dependence of the sputtered nanocrystalline silicon thin films on teflon substrates deposited by RF magnetron sputtering method, 2012 IEEE Symposium on Humanities, Science and Engineering Research, p. 436‒439. DOI: 10.1109/SHUSER.2012.6269003.10.1109/SHUSER.2012.6269003 ↗
34. Measurement of hardness and elastic modulus by instrumented indentation: advances in understanding and refinements to methodology10.1557/jmr.2004.19.1.3 ↗
35. J. Rosen/X-ray photoelectron spectroscopy analysis of TiBx (1.3 ≤ x ≤ 3.0) thin films10.1116/6.0000789 ↗
36. The VDI 3198 indentation test evaluation of a reliable qualitative control for layered compounds10.1016/S0924-0136(03)00300-5 ↗
37. Hard nanocomposite coatings: thermal stability, oxidation resistance and toughness10.1016/j.surfcoat.2012.05.073 ↗
38. Material selection for hard coatings10.1116/1.573700 ↗
39. Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides10.1116/1.1619414 ↗
40. D. Mogilyanski/compositional and structural changes in TiB2 films induced by bias, in situ and post-deposition annealing
41. Titanium diboride thin films produced by dc-magnetron sputtering: structural and mechanical properties10.1016/j.surfcoat.2011.01.014 ↗
42. Oxidation kinetics of overstoichiometric TiB2 thin films grown by DC magnetron sputtering10.1016/j.corsci.2022.110493 ↗
43. Improving the high-temperature oxidation resistance of TiB2 thin films by alloying with Al10.1016/j.actamat.2020.07.025 ↗
44. Microstructure of d.c. magnetron sputtered TiB2 coatings10.1016/j.surfcoat.2003.12.029 ↗
45. A. Warkentin/thermal damage of conventional hard chromium coatings on 416 stainless steel10.1016/j.engfailanal.2019.07.007 ↗
46. Modelling the hardness response of coated systems: the plate bending approach10.1016/0257-8972(94)90220-8 ↗
47. The relationship between hardness and scratch adhesion10.1016/0040-6090(87)90382-8 ↗
48. The influence of the H/E ratio on wear resistance of coating systems – insights from small-scale testing10.1016/j.surfcoat.2022.128272 ↗
49. Tribological study of nano-multilayered ultra-hard coatings based on TiB2
50. Wear properties of carbon-rich tungsten carbide films
51. Friction and wear enhancement of magnetron sputtered bilayer Cr–N/TiB2 thin-film coatings
52. Comparison of microstructure and tribological properties of plasma-sprayed TiN, TiC and TiB2 coatings10.1016/j.surfcoat.2019.05.071 ↗
53. The behavior of TiAlN and TiAlCrSiN films in abrasive and adhesive tribological contacts10.3390/coatings13091603 ↗
54. Effect of synchronized bias in the deposition of TiB2 thin films using high power impulse magnetron sputtering10.1116/1.5003194 ↗
55. Comparative study of chromium nitride coatings deposited by unbalanced and balanced magnetron sputtering10.1016/j.tsf.2004.08.067 ↗
56. Interfaces and stresses in thin films10.1016/S1359-6454(99)00286-4 ↗
57. Low stress TiB2 coatings with improved tribological properties10.1016/S0040-6090(01)01481-X ↗