Special Section Guest Editorial: Non-chemically Amplified Resists for EUV Lithography
Source abstract
Abstract
The Journal of Micro/Nanopatterning, Materials, and Metrology (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry.
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Source: openalex_inverted_index · Quality: needs review · Source record ↗
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Research context
OpenAlex topics: Advancements in Photolithography Techniques · Nanofabrication and Lithography Techniques · Semiconductor materials and devices
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Affiliations
Lam Research Belgium BV, Leuven, Belgium
Paul Scherrer Institute, Villigen, Switzerland
References
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