Localized and cascading secondary electron generation as causes of stochastic defects in extreme ultraviolet projection lithography (Erratum)
Source abstract
Abstract
The Journal of Micro/Nanopatterning, Materials, and Metrology (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry.
The source flagged this abstract for review. Check formulas and completeness against the original publication.
Source: openalex_inverted_index · Quality: needs review · Source record ↗
Source flags: short_text
Source flags: short_text
Research context
OpenAlex topics: Advancements in Photolithography Techniques · Electron and X-Ray Spectroscopy Techniques · Integrated Circuits and Semiconductor Failure Analysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Hitachi High-Technologies Corporation, Tokyo, Japan
References
Reference metadata was not supplied for this record.