DataVXJournal of Micro/Nanopatterning, Materials, and MetrologyPaper
journal article·2026-03-01

Dry resist process development toward depth of focus improvement in high NA EUV lithography

Ching-Chung Huang, Ali Haider, Zhengtao Chen, Francesco Gullo, Mohand Brouri, Shruti Jambaldinni, Andrew Lushington, Nizan Kenane, Boris Volosskiy, Mihir Gupta, Matteo Beggiato, Christophe Beral, Danilo De Simone, Hyo Seon Suh, Bernardo Oyarzun Rivera, Joost van Bree, Herman Nicolai, Gijsbert Rispens, Anuja De Silva, Rich Wise

Journal of Micro/Nanopatterning, Materials, and Metrology· Volume 25· Issue 02
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Abstract

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Research context

OpenAlex topics: Advancements in Photolithography Techniques · Nanofabrication and Lithography Techniques · Force Microscopy Techniques and Applications

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Affiliations

Lam Research Belgium BV, Leuven, Belgium

Lam Research Corp., Fremont, California, United States

imec, Leuven, Belgium

ASML, Veldhoven, The Netherlands

Funding

European Union’s Horizon Europe ACT10 program

References

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