Lithography patterning stack mechanical-based optimization model

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Research context

OpenAlex topics: Advancements in Photolithography Techniques · Nanofabrication and Lithography Techniques · VLSI and FPGA Design Techniques

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Affiliations

Lam Research Corporation, Fremont, California, United States

Funding

Lam Research Corporation

References

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