MF-ILT: efficient gradient-driven inverse lithography technology with multi-scale adaptation and frequency-domain segmentation synergy
Bibliographic record
Abstract
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Research context
OpenAlex topics: Advancements in Photolithography Techniques · Nanofabrication and Lithography Techniques · Block Copolymer Self-Assembly
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Affiliations
Anhui University of Science and Technology, School of Computer Science and Engineering, Huainan, China
Hefei University of Technology, School of Microelectronics, Hefei, China
Funding
National Natural Science Foundation of China · Key Research and Development Projects in Anhui Province
References
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