Cascade and cluster of correlated reactions as causes of stochastic defects in extreme ultraviolet lithography (Erratum)
Source abstract
Abstract
The Journal of Micro/Nanopatterning, Materials, and Metrology (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry.
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Research context
OpenAlex topics: Advancements in Photolithography Techniques · Electron and X-Ray Spectroscopy Techniques · Integrated Circuits and Semiconductor Failure Analysis
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Affiliations
Hitachi High-Tech Corporation, Tokyo, Japan
References
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