Effects of extreme ultraviolet multilayer roughness on 2D patterning
Bibliographic record
Abstract
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Research context
OpenAlex topics: Surface Roughness and Optical Measurements
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Affiliations
EUV Tech, Martinez, California, United States
The Center for X-ray Optics, Lawrence Berkeley National Lab, Berkeley, California, United States
Panoramic Technologies, Inc., Burlingame, California, United States
References (16)
Show source-provided references
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13. Goodman · 2015
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16. Mask roughness induced LER in EUV lithography