Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (Erratum)

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Research context

OpenAlex topics: Advancements in Photolithography Techniques · Welding Techniques and Residual Stresses · Electron and X-Ray Spectroscopy Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Paul Scherrer Institute, Laboratory for X-Ray Nanoscience and Technologies, Villigen PSI, Switzerland

Hanyang University, Division of Materials Science and Engineering, Seoul, Korea

Paul Scherrer Institute, Laboratory of Nanoscale Biology, Villigen PSI, Switzerland

References

Reference metadata was not supplied for this record.