Effect of chemical action on shear thickening polishing of YAG
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Advanced Surface Polishing Techniques · Laser Material Processing Techniques · Surface Roughness and Optical Measurements
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (36)
Show source-provided references
1. VCSEL pumped Nd: YAG laser with 95 Waverage power and user-selectable nanosecond pulses
2. Preparation of Nd:Y3Al5O12 nanocrystals by low temperature glycol route, Crystal Research
3. Influence of surface roughness on laser-induced damage of Nd :YAG transparent ceramics10.1016/j.ceramint.2015.06.036 ↗
4. Electrolysis combined shear thickening polishing method10.1016/j.jmapro.2023.10.031 ↗
5. Surface smoothing of polycrystalline substrates with gas cluster ion beams10.1143/JJAP.49.06GH09 ↗
6. Analysis of surface quality and processing optimization of magnetorheological polishing of KDP crystal10.1007/s12596-015-0272-7 ↗
7. Bonnet polishing high-slope aspheric surface
8. Preparation of ultrasmooth and defect-free 4H-SiC(0001) surfaces by elastic emission machining10.1007/s11664-005-0124-3 ↗
9. Chemical mechanical polishing: theory and experiment10.1007/s40544-013-0035-x ↗
10. Effects of slurry pH on chemical and mechanical actions during chemical mechanical polishing of YAG10.1016/j.apsusc.2021.150359 ↗
11. Chemical-mechanical polishing YAG for wafer bonding10.1149/05007.0387ecst ↗
12. Morphological characteristics and formation mechanism of latent scratches in chemical mechanical polishing10.1016/j.jmatprotec.2022.117689 ↗
13. Chemical mechanical polishing and direct bonding of YAG10.1149/08605.0217ecst ↗
14. A novel chemical mechanical polishing slurry for yttrium aluminum garnet crystal10.1016/j.apsusc.2019.143601 ↗
15. Effect of particle size and pH value of slurry on chemical mechanical polishing of SiO2 film10.1149/2162-8777/ac495f ↗
16. Chemical mechanical polishing of transparent Nd: YAG ceramics
17. Machining parameter optimization in shear thickening polishing of gear surfaces10.1016/j.jmrt.2020.03.028 ↗
18. Fast-tool-servo-controlled shear-thickening micropolishing10.1016/j.ijmachtools.2022.103968 ↗
19. Simulation and experimental study on polishing of spherical steel by non-Newtonian fluids10.1007/s00170-020-05055-w ↗
20. Shear thickening polishing of black lithium tantalite substrate, international journal. Precision engineering
21. Rheological properties of magnetic field-assisted thickening fluid and high-efficiency spherical polishing of ZrO2 ceramics10.1007/s00170-022-09344-4 ↗
22. Multi-pole magnetorheological shear thickening polishing on inner surface of aluminum alloy slender tubes10.1016/j.jmrt.2023.11.235 ↗
23. Simulation and experimental study of ultrasonic-assisted shear thickening polishing of cemented carbide10.1016/j.jmapro.2023.07.042 ↗
24. Adaptive shearing-gradient thickening polishing (AS-GTP) and subsurface damage inhibition10.1016/j.ijmachtools.2020.103651 ↗
25. Material removal characteristics of magnetic-field enhanced shear thickening polishing technology10.1016/j.jmrt.2021.09.092 ↗
26. Chemistry enhanced shear thickening polishing of Ti–6Al–4V10.1016/j.precisioneng.2021.04.002 ↗
27. Surface polishing and modification of Ti-6Al-4V alloy by shear thickening polishing10.1016/j.surfcoat.2023.129771 ↗
28. Surface chemical processes in chemical mechanical polishing: relationship between silica material removal rate and the point of zero charge of the abrasive material10.1149/1.1516777 ↗
29. Regularities of sol-gel processes in the preparation of polysilicates10.1134/S1087659618030136 ↗
30. ESCA studies of yttrium aluminum garnets10.1021/jp9838801 ↗
31. Physical and electrical characterization of ultrathin yttrium silicate insulators on silicon10.1063/1.1375018 ↗
32. Chemical bonding and electronic structures of the Al2SiO5 polymorphs, andalusite, sillimanite, and kyanite: X-ray photoelectron- and electron energy loss spectroscopy studies10.2138/am.2006.1887 ↗
33. Reactions at the Al/SiO2/SiC layered interface10.1007/BF01129953 ↗
34. Influence of partial charge on the material removal rate during chemical polishing10.1111/jace.15995 ↗
35. Recent progress on synthesis, multi-scale structure, and properties of Y-Si-O oxides10.1179/1743280414Y.0000000033 ↗
36. The effect of abrasive hardness on the chemical-assisted polishing of (0001) plane sapphire10.1557/JMR.2005.0072 ↗