journal article·2024-02

Unveiling the multifaceted impact of C2H2 flow on SiCN CVD coatings: Mechanical mastery and beyond

Dhruva Kumar, Soham Das, Bibhu P. Swain, Spandan Guha

Ceramics International· Volume 50· Issue 4
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OpenAlex topics: Diamond and Carbon-based Materials Research · Advanced ceramic materials synthesis · Semiconductor materials and devices

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References (68)

Show source-provided references
1. An anti-oxidative coating made from particle-filled SiCN precursor for applications up to 800 °C10.1016/j.jallcom.2022.165236 ↗
2. Investigation of a new method of the organosilicon compounds activation by a low-energy electron beam for SiCN-coatings deposition10.1380/ejssnt.2020.38 ↗
3. Evaluation of the elastic-plastic properties of SiCN coating system by finite element simulations10.1016/j.jeurceramsoc.2017.05.017 ↗
4. Investigation of the conditions for the formation of SiCN-based coatings in arc discharge with self-heated hollow cathode
5. Eco-friendly Bi(Ni2/5Ti2/5Fe1/5)O3 nanoceramics: synthesis, dielectric and impedance studies10.1016/j.ceramint.2021.04.237 ↗
6. Structural, electrical and magnetic properties of eco-friendly complex multiferroic material: Bi(Co0.35Ti0.35Fe0.30)O310.1016/j.ceramint.2018.09.249 ↗
7. Structural, dielectric, electrical and magnetic characteristics of lead-free multiferroic: Bi(Cd0.5Ti0.5)O3 single bond BiFeO3 solid solution10.1016/j.jallcom.2018.03.114 ↗
8. Highly conformal carbon-doped SiCN films by plasma-enhanced chemical vapor deposition with enhanced barrier properties10.1016/j.tsf.2018.04.042 ↗
9. Amorphous silicon carbonitride thin-film coatings produced by remote nitrogen microwave plasma chemical vapour deposition using organosilicon precursor10.1002/aoc.3871 ↗
10. Hydrogenated amorphous silicon films deposited by electron cyclotron resonance chemical vapor deposition at room temperature with different radio frequency chuck powers10.1016/j.tsf.2019.137534 ↗
11. Hard Si–N–C films with a tunable band gap produced by pulsed glow discharge deposition10.1016/j.surfcoat.2004.10.010 ↗
12. Preparation and optical properties of SiCN thin films deposited by reactive magnetron sputtering10.1007/s10854-017-6373-0 ↗
13. Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering10.1016/j.apsusc.2018.03.040 ↗
14. Chemical vapour deposition of coatings10.1016/S0079-6425(01)00009-3 ↗
15. Silicon carbonitride thin films deposited by reactive high power impulse magnetron sputtering10.1016/j.surfcoat.2017.12.037 ↗
16. A comparative study of a:SiCN:H thin films fabricated with acetylene and methane
17. Structural, electrical, and multiferroic characteristics of lead-free multiferroic: Bi (Co0.5Ti0.5) O3–BiFeO3 solid solution10.1039/C8RA02306A ↗
18. Studies of structural, electrical and ferroelectric characteristics of gadolinium and yttrium modified bismuth ferrite10.1016/j.matchemphys.2021.124359 ↗
19. Structural, electrical and ferroelectric characteristics of Bi (Fe0.9La0.1) O310.1016/j.ceramint.2018.08.185 ↗
20. Microstructure and dielectric properties of silicon carbonitride dielectric barrier films deposited by sputtering10.1142/S0218625X18500658 ↗
21. Influence of different carbon precursors on optical and electrical properties of silicon carbonitride thin films10.1149/09702.0059ecst ↗
22. Structural and optical properties of the SiCN thin films prepared by reactive magnetron sputtering10.1016/j.apsusc.2010.11.166 ↗
23. Pusch · 2011 · vol. 205 · S119
24. A comparative study of a:SiCN:H thin films fabricated with acetylene and methane10.1149/2162-8777/aca9fb ↗
25. Influence of different carbon precursors on optical and electrical properties of silicon carbonitride thin films10.1149/09702.0059ecst ↗
26. Thermal plasma chemical vapor deposition of wear-resistant, hard Si–C–N coatings10.1016/j.surfcoat.2006.08.047 ↗
27. J.J. Wu, K.H. Chen et al. Effect of carbon sources on silicon carbon nitride films growth in an electron cyclotron resonance plasma chemical vapor deposition reactor, Diam. Relat. Mater. https://doi.org/10.1016/S0925-9635(99)00218-6.10.1016/S0925-9635(99)00218-6 ↗
28. Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry10.1016/j.surfcoat.2005.02.077 ↗
29. Silicon carbonitride (SiCN) films by remote hydrogen microwave plasma CVD from tris(dimethylamino)silane as novel single-source precursor10.1002/cvde.201004287 ↗
30. Impact of elevated temperature over different properties of CVD SiCN coating developed in Nitrogen gas atmosphere10.1007/s12633-021-01631-1 ↗
31. The effect of Si (111) substrate surface cleaning on growth rate and crystal quality of MOVPE grown AlN10.35378/gujs.822954 ↗
32. The pyrolysis of acetylene at temperatures from 500 to 1000°C
33. Synergistic effect of carbon nanofiber/nanotube composite catalyst on carbon felt electrode for high-performance all-vanadium redox flow battery10.1021/nl402566s ↗
34. Growth of carbon nanomaterials on granular activated carbon10.4028/www.scientific.net/AMR.264-265.535 ↗
35. The effect of acetylene flow rate on the uniform deposition of thick DLC coatings on the inner surface of pipes with different draw ratios10.1016/j.vacuum.2021.110720 ↗
36. Relationship of chemical and structural properties with the tribological behavior of sputtered SiCN films10.1016/j.surfcoat.2008.06.126 ↗
37. Effect of C2H2 gas flow rate on synthesis and characteristics of Ti–Si–C–N coating by cathodic arc plasma evaporation10.1016/j.jmatprotec.2009.05.008 ↗
38. The influence of CH4 addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH4/N2/Ar/hexamethyldisilazane micro wave plasma10.1016/j.tsf.2011.07.054 ↗
39. Effect of comminution on particle shape and surface roughness and their relation to flotation process10.1016/j.minpro.2010.02.007 ↗
40. Effect of PECVD silicon oxynitride film composition on the surface passivation of silicon wafers10.1016/j.solmat.2011.09.052 ↗
41. Correlation between the photoluminescence and chemical bonding in silicon nitride nanowires deposited by chemical vapour deposition10.1016/j.jallcom.2015.12.261 ↗
42. Annealing of silicon carbonitride nanostructured thin films: interdependency of hydrogen content, optical, and structural properties10.1007/s10853-017-1576-6 ↗
43. Influence of Ar/C2H2 ratio on the structure of hydrogenated carbon films10.1016/j.jnoncrysol.2009.05.009 ↗
44. Synthesis of silicon carbonitride dielectric films with improved optical and mechanical properties from tetramethyldisilazane10.1134/S1087659613010057 ↗
45. XPS studies of amorphous SiCN thin films prepared by nitrogen ion-assisted pulsed-laser deposition of SiC target10.1016/S0925-9635(01)00422-8 ↗
46. X-ray photoelectron spectroscopy analysis of oxygen annealed radio frequency sputter deposited SiCN thin films10.1149/1.2198127 ↗
47. Laser-induced chemical vapor deposition of nanostructured silicon carbonitride thin films10.1063/1.366669 ↗
48. Formation of α-Si1−xCx:H and nc-SiC films grown by HWCVD under different process pressure10.1016/j.apsusc.2011.06.165 ↗
49. Synthesis of nanocrystalline silicon carbonitride films by remote plasma enhanced chemical vapor deposition using the mixture of hexamethyldisilazane with helium and ammonia10.1016/S0022-0248(02)02041-9 ↗
50. On the formation of the crystalline phases and nanostructure of silicon carbonitride layers grown on gallium arsenide substrates10.1134/S0022476612040270 ↗
51. Correlation between full width at half maximum (FWHM) of XRD peak with residual stress on ground surfaces
52. Composition and structure of silicon carbonitride layers grown on Si (100)/(Fe, N, Co) substrates10.1134/S0022476612040282 ↗
53. Fernandes · Nanostructure of cellulose microfibrils in spruce wood · 2011 · 108 · E1195
54. Effect of particle size on structural, magnetic and dielectric properties of manganese substituted nickel ferrite nanoparticles10.1016/j.jmmm.2014.11.019 ↗
55. Crystalline size effects on texture coefficient, electrical and optical properties of sputter-deposited Ga-doped ZnO thin films10.1016/j.jmst.2014.11.009 ↗
56. Evaluation of corrosion resistance of SiCN films deposited by HWCVD using organic liquid materials10.1016/j.tsf.2007.06.184 ↗
57. Study of the Si chemical bonding and the semiconductive behavior of SiCN coatings and their correlation with anti-corrosion properties10.1002/ppap.200600068 ↗
58. The relationship between surface roughness and corrosion
59. In vitro corrosion of titanium nitride and oxynitride-based biocompatible coatings deposited on stainless steel10.3390/coatings10080710 ↗
60. Hertz model or Oliver & Pharr analysis? Tutorial regarding AFM nanoindentation experiments on biological samples10.1088/2053-1591/ab79ce ↗
61. Nanoindentation-probed Oliver-Pharr half-spaces in alkali-activated slag-fly ash pastes: multimethod identification of microelasticity and hardness10.1080/15376494.2021.1941450 ↗
62. Theoretical model for determining elastic modulus of ceramic materials by nanoindentation10.1016/j.mtla.2021.101121 ↗
63. Morphological, mechanical property analysis and comparative study over structural properties of CVD TiN film grown under different substrate temperature in nitrogen gas atmosphere10.1007/s12633-020-00807-5 ↗
64. Investigation over effect of different carbon content on various properties of titanium carbon nitride (TiCN) coating grown on Si (100) substrate by chemical vapor deposition (CVD) process10.1140/epjp/s13360-022-02587-w ↗
65. Influence of post-heat treatment over structural network and mechanical properties of carbon (C)-incorporated CVD TiCN thin-film coating10.1007/s42823-023-00499-y ↗
66. Mechanical and optical properties of hard SiCN coatings prepared by PECVD10.1016/S0040-6090(03)01057-5 ↗
67. Relationship of chemical and structural properties with the tribological behavior of sputtered SiCN films10.1016/j.surfcoat.2008.06.126 ↗
68. Effect of nitrogen doping and temperature on mechanical durability of silicon carbide thin films10.1038/s41598-018-28704-3 ↗