Influence of the crystalline nature of growing surface on the properties of vanadium pentoxide thin films
Source abstract
Abstract
Abstract Vanadium pentoxide (V2O5) thin films have been deposited by reactive direct current (DC) magnetron sputtering onto glass and Si (100) substrates in identical deposition conditions and investigated for their physical properties. The films deposited on glass substrates were amorphous whereas the film deposited on Si substrates were polycrystalline (orthorhombic crystal structure and strong (411) orientation plane). The core level spectrum of the film showed V2p1/2 and V2p3/2 peaks at the binding energy 517.18 and 524.38 eV respectively whichconfirmed the presence of V2O5. The films exhibited a nanosheet-like surface morphology grown normal to the substrate (Si and Glass). The optical bandgap value of the films deposited on glass and Si substrates was found to be in the range of 2.5–3.49 eV and 1.72–2.45 eV respectively. V2O5 films deposited on glass and Si (100) exhibited a temperature coefficient of resistance (TCR) of −0.6 and −1.8%/°C respectively.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Transition Metal Oxide Nanomaterials · ZnO doping and properties · Ga2O3 and related materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (22)
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