Effect of hot-dip siliconizing time on phase composition and microstructure of Mo–MoSi2 high temperature structural materials

Abstract Mo–MoSi2 high temperature structural materials were obtained by hot-dip siliconizing method. The results show that the silicon melt and molybdenum substrate have good wettability, molten silicon reacts with molybdenum substrate to form a molybdenum silicide phase with a columnar structure, and a strong MoSi2 crystallographic preferred orientation (CPO) on the (110) crystal face is characterized. While, the Mo–MoSi2 high temperature structural materials consist mainly of silicon rich layer, MoSi2 layer, interface layer and molybdenum substrate. The coating surfaces contain a high silicon concentration (55–65 wt%) than the MoSi2 layer (30–35 wt%). Moreover, the thicknesses and the average grain sizes of siliconized coatings increase sharply with increasing siliconizing time. The coatings thicknesses are 20, 25, 30, and 50 µm, respectively. And the average grain sizes are 6.9, 9.3, 11.7, and 11.8 µm, respectively.