Photocatalytic activity of thin TiO2 films deposited using sol–gel and plasma enhanced chemical vapor deposition methods

Thin titanium dioxide films, deposited using RF PECVD and sol–gel techniques, were studied comparatively with respect to their bactericidal as well as self-cleaning properties. The effect of the deposition process on film morphology, chemical and crystalline structure, bactericidal activity and hydrophilic properties was investigated using scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR), surface profilometry, optical microscopy and contact angle measurements. It was found that the bactericidal activity of amorphous TiO2 films, produced using the RF PECVD method, as either comparable to or better than those of crystalline (anatase) films deposited by means of the sol–gel technique. One reason for such advantageous behavior of plasma deposited materials is thought to be their substantially higher surface roughness, as revealed by AFM measurements. The hydrophilic effect, induced with UV irradiation, was strongest in the case of sol–gel films, but the RF PECVD synthesized coatings were found to be only slightly less hydrophilic. The conclusion follows that both sol–gel and RF PECVD techniques are equally capable of producing titanium dioxide films of high photocatalytic quality.