Preparation and performance of low-emissivity Al-doped ZnO films for energy-saving glass
Source abstract
Abstract
Abstract Low-emissivity Al-doped ZnO films were deposited on the surface of glass by direct current magnetron sputtering method. The infrared emissivity of sample was focused on. The structural characteristics were investigated by the X-ray diffractometry and scanning electron microscopy, while the properties were measured by a four-point probe, an infrared emissivity measurement instrument and an UV–Vis spectrophotometer. The results show that the infrared emissivity of the AZO film is affected by substrate temperature, working pressure and sputtering power. The film deposited at 200 °C, 1.0 Pa and 80 W possesses the lowest emissivity, 0.41. There is a very strong correlation between emissivity and resistivity. When the resistivity is low, the infrared emissivity increases with the increase of resistivity, following the Hagen-Rubens relationship. When the resistivity is high, the correlation between them decreases.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Thermal Radiation and Cooling Technologies · ZnO doping and properties · GaN-based semiconductor devices and materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (30)
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1. Investigation of various low emissivity glass materials for green energy building construction in Indian climatic zones10.1016/j.matpr.2017.07.144 ↗
2. Preparation and performance of ZrAlN antireflective coatings for low-emissivity glasses10.1016/j.ceramint.2017.07.105 ↗
3. Condensation on the outdoor surface of window glazing calculation methods, key parameters and prevention with low-emissivity coatings10.1016/j.tsf.2012.12.110 ↗
4. Effect of TiNx inter/outer layer on Ag(Cr) thin films at elevated temperatures for low emissivity applications10.7567/JJAP.53.08NE01 ↗
5. Effect of TaNx on electrical and optical properties of annealed TaNx/Ag/TaNx films10.1002/sia.5305 ↗
6. Preparation, characterization and performance of Ti1-xAlxN/Ag/Ti1-xAlxN low-emissivity films10.1016/j.apsusc.2013.12.146 ↗
7. The preparation of thermally stable TiNx/Ag(Mo)/TiNx ultrathin films by magnetron sputtering10.1016/j.tsf.2014.05.029 ↗
8. High transmittance, low emissivity glass covers for flat plate collectors: applications and performance10.1016/j.egypro.2012.11.014 ↗
9. Terahertz reflection and visible light transmission of ITO films affected by annealing temperature and applied in metamaterial absorber10.1016/j.vacuum.2017.12.006 ↗
10. Optical and electrical properties of ITO thin films sputtered on flexible FEP substrate as passive thermal control system for space applications10.1016/j.solmat.2015.10.035 ↗
11. Water-repellency, ultraviolet protection and infrared emissivity properties of AZO film on polyester fabric10.1016/j.ceramint.2016.11.032 ↗
12. Rare earth doped zinc oxide nanophosphor powder: a future material for solid state lighting and solar cells10.1021/acsphotonics.7b00777 ↗
13. Influence of Al concentration and annealing temperature on structural, optical, and electrical properties of Al Co-doped ZnO thin films10.1016/j.apsusc.2015.04.233 ↗
14. Investigation of the thickness effect on material and surface texturing properties of sputtered ZnO:Al films for thin-film Si solar cell applications10.1016/j.vacuum.2015.10.027 ↗
15. The Al doping effect on the surface, optical, electrical and properties of the ZnO and AZO thin films prepared by RF sputtering technique10.1016/j.vacuum.2017.04.025 ↗
16. Low-emitting surfaces prepared by applying transparent aluminum-doped zinc oxide coatings via a sol-gel process10.1016/j.tsf.2011.04.105 ↗
17. Synthesis and characterization of aluminum-boron co-doped ZnO nanostructures10.1016/j.materresbull.2012.10.042 ↗
18. Mass spectrometry investigation of magnetron sputtering discharges10.1016/j.vacuum.2017.06.032 ↗
19. Effect of Br6+ ions on the structural, morphological and luminescent properties of ZnO/Si thin films10.1016/j.apsusc.2013.04.145 ↗
20. Influence of discharge power and annealing temperature on the properties of indium tin oxide thin films prepared by pulsed-DC magnetron sputtering10.1016/j.vacuum.2015.08.019 ↗
21. VO2/AZO double-layer films with thermo chromism and low-emissivity for smart window applications10.1016/j.jnoncrysol.2013.04.041 ↗
22. ITO and AZO films for low emissivity coatings in hybrid hotovoltaic thermal applications10.1016/j.solener.2017.06.033 ↗
23. Application of indium tin oxide (ITO) thin film as a low emissivity film on Ni-based alloy at high temperature10.1016/j.infrared.2016.07.021 ↗
24. Effect of sputtering pressure on Al-doped ZnO films by DC magnetron sputtering10.3724/SP.J.1077.2012.12213 ↗
25. Structural, electrical and optical properties of aluminum doped zinc oxide films prepared by radio frequency magnetron sputtering10.1063/1.365556 ↗
26. Substrate temperature dependence of the properties of ZAO thin films deposited by magnetron sputtering10.1016/S0169-4332(03)00523-3 ↗
27. Effect of annealing treatment on optical, electrical properties and energy structure of transparent conductive CdIn2O4 thin films
28. Deposition and characterization of AZO thin films on flexible glass substrates using DC magnetron sputtering technique10.1016/j.ceramint.2016.12.106 ↗
29. Influence of RF power on structural, morphology, electrical, composition and optical properties of Al-doped ZnO films deposited by RF magnetron sputtering
30. Frank · 1963 · 15 · 348