Influence of colloidal silica properties on chemical mechanical polishing of zirconia ceramics
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Advanced Surface Polishing Techniques · Advanced ceramic materials synthesis · Advanced materials and composites
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (44)
Show source-provided references
1. Advanced ceramic components: materials, fabrication, and applications10.1016/j.jiec.2020.02.002 ↗
2. Aluminum oxide and alumina ceramics (review). Part 1. Properties of Al2O3 and commercial production of dispersed Al2O310.1007/s11148-019-00304-2 ↗
3. Effect of mixed-shaped silica sol abrasives on surface roughness and material removal rate of zirconia ceramic cover10.1016/j.ceramint.2020.06.159 ↗
4. Study on the interaction between SiO2 and ZrO2 in the chemical mechanical polishing of zirconia ceramic with colloidal silica10.1016/j.ceramint.2021.04.177 ↗
5. Influence of humidity on the fretting wear of self-mated tetragonal zirconia ceramics10.1016/S1359-6454(00)00079-3 ↗
6. Investigation on polishing of zirconia ceramics using magnetic compound fluid: relationship between material removal and surface roughness10.20965/ijat.2021.p0017 ↗
7. The grinding force modeling and experimental study of ZrO2 ceramic materials in ultrasonic vibration assisted grinding10.1016/j.ceramint.2019.01.216 ↗
8. Surface planarization of zirconia ceramic achieved by polyacrylamide grafted nanodiamond composite abrasives through chemical mechanical polishing10.1016/j.ceramint.2022.03.265 ↗
9. Surface roughness of monolithic zirconia ceramic submitted to different polishing systems10.20396/bjos.v18i0.8657266 ↗
10. Polishing of zirconia ceramics by chemically-induced micro-nano bubbles10.1016/j.ceramint.2022.02.275 ↗
11. Renaissance of Stöber method for synthesis of colloidal particles: new developments and opportunities10.1016/j.jcis.2020.10.014 ↗
12. Silica sol as a nanoglue: flexible synthesis of composite aerogels10.1126/science.284.5414.622 ↗
13. Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry10.1364/AO.49.005480 ↗
14. Polythiolactone‐decorated silica particles: a versatile approach for surface functionalization, catalysis and encapsulation10.1002/chem.202101320 ↗
15. Chemical mechanical polishing for sapphire wafers using a developed slurry10.1016/j.jmapro.2021.01.004 ↗
16. Green chemical mechanical polishing of sapphire wafers using a novel slurry10.1039/D0NR04705H ↗
17. Synthesis of Fe metal precipitated colloidal silica and its application to W chemical mechanical polishing (CMP) slurry10.1016/j.jcis.2010.04.083 ↗
18. Accelerated C-face polishing of silicon carbide by alkaline polishing slurries with Fe3O4 catalysts10.1016/j.jece.2021.106863 ↗
19. Characterization of colloidal silica abrasives with different sizes and their chemical–mechanical polishing performance on 4H-SiC (0001)10.1016/j.apsusc.2014.04.048 ↗
20. Self-assembly preparation of popcorn-like colloidal silica and its application on chemical mechanical polishing of zirconia ceramic10.1016/j.ceramint.2020.06.202 ↗
21. Nanoindentation characterization of the elasticity, plasticity and machinability of zirconia10.1016/j.msea.2015.01.051 ↗
22. Effects of slurry pH on chemical and mechanical actions during chemical mechanical polishing of YAG10.1016/j.apsusc.2021.150359 ↗
23. The effect of the interface reaction mode on chemical mechanical polishing10.1016/j.cirpj.2020.08.005 ↗
24. Single asperity tribochemical wear of silicon by atomic force microscopy10.1557/JMR.2009.0024 ↗
25. Humidity dependence of tribochemical wear of monocrystalline silicon10.1021/acsami.5b03043 ↗
26. Influence of partial charge on the material removal rate during chemical polishing10.1111/jace.15995 ↗
27. Effect of abrasive particle size on tribochemical wear of monocrystalline silicon10.1016/j.triboint.2016.12.050 ↗
28. Temperature-Dependent mechanochemical wear of silicon in water: the role of Si–OH surfacial groups10.1021/acs.langmuir.9b00790 ↗
29. Effect of surface silanol groups on friction and wear between amorphous silica surfaces10.1021/acs.langmuir.8b04291 ↗
30. Size-dependent dissociation of surface hydroxyl groups of silica in aqueous solution10.1016/j.colsurfa.2021.127446 ↗
31. Characteristics of slurry recycling in chemical mechanical polishing (CMP) of fused silica (FS)10.1149/2.0121903jss ↗
32. Nano-scale surface of ZrO2 ceramics achieved efficiently by peanut-shaped and heart-shaped SiO2 abrasives through chemical mechanical polishing10.1016/j.ceramint.2020.02.108 ↗
33. Surface acidity of colloidal silica and its correlation with sapphire surface polishing10.1016/j.colsurfa.2022.129718 ↗
34. Porous Silica — its properties and use as support in column liquid chromatography
35. Bioinspired one-step synthesis of pomegranate-like Silica@Gold nanoparticles with surface-enhanced Raman scattering activity10.1021/acs.langmuir.0c00334 ↗
36. Adsorption of polar and nonpolar compounds onto complex nanooxides with silica, alumina, and titania10.1016/j.jcis.2010.04.062 ↗
37. Fabrication of mechanically robust nanoporous ZrSiO4 ceramics at low temperature with a low doping level of Mn dopant10.1111/ijac.14652 ↗
38. Mechanical and thermal properties of ZrSiO410.1080/00223131.2017.1359117 ↗
39. Preparation of high-purity ZrSiO4 powder using sol-gel processing and mechanical properties of the sintered body10.1111/j.1151-2916.1992.tb05594.x ↗
40. Zircon–zirconia (ZrSiO4–ZrO2) dense ceramic composites by spark plasma sintering10.1016/j.jeurceramsoc.2011.10.021 ↗
41. Microstructural responses of Zirconia materials to in-situ SEM nanoindentation10.1016/j.jmbbm.2021.104450 ↗
42. Synthesis of ZrO2 nanoparticles and effect of surfactant on dispersion and stability10.1016/j.ceramint.2020.01.236 ↗
43. Determination of near-surface forces in optical polishing using atomic force microscopy10.1088/0957-4484/5/2/002 ↗
44. Chemical processes in glass polishing10.1016/0022-3093(90)90200-6 ↗