Novel ceria/graphene oxide composite abrasives for chemical mechanical polishing
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Advanced Surface Polishing Techniques · Diamond and Carbon-based Materials Research · Advanced materials and composites
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (50)
Show source-provided references
1. Chemical mechanical planarization: slurry chemistry, materials, and mechanisms10.1021/cr900170z ↗
2. Atomic-scale planarization surface of quartz glass induced by novel green chemical mechanical polishing using three ingredients
3. Angstrom surface on copper induced by novel green chemical mechanical polishing using ceria and silica composite abrasives10.1016/j.apsusc.2023.158382 ↗
4. A novel atomic removal model for chemical mechanical polishing using developed mesoporous shell/core abrasives based on molecular dynamics10.1039/D3NR04420C ↗
5. Development of core–shell SiO2@ A-TiO2 abrasives and novel photocatalytic chemical machinal polishing for atomic surface of fused silica
6. Novel green chemical mechanical polishing of fused silica through designing synergistic CeO2/h-BN abrasives with lubricity10.1016/j.apsusc.2023.157978 ↗
7. Atomic surface of cobalt-chromium-molybdenum alloy induced by novel green chemical mechanical polishing through controlling pH values and oxidation processes10.1016/j.apsusc.2024.159356 ↗
8. Atomic surface of fused silica and polishing mechanism interpreted by molecular dynamics and density functional theory
9. Unprecedented atomic surface of silicon induced by environmentally friendly chemical mechanical polishing10.1039/D3NR01149F ↗
10. A novel approach of chemical mechanical polishing for a titanium alloy using an environment-friendly slurry10.1016/j.apsusc.2017.08.064 ↗
11. Polishing behaviors of ceria abrasives on silicon dioxide and silicon nitride CMP10.1016/j.powtec.2010.09.025 ↗
12. Material removal mechanism in chemical mechanical polishing: theory and modeling10.1109/66.920723 ↗
13. Chemical processes in glass polishing10.1016/0022-3093(90)90200-6 ↗
14. Mechanism of polishing of SiO2 films by CeO2 particles10.1016/S0022-3093(01)00364-7 ↗
15. Gadolinium doped CeO2 for efficient oxygen and hydrogen evolution reaction10.1016/j.fuel.2021.122319 ↗
16. Tight-binding quantum chemical molecular dynamics simulation of mechano-chemical reactions during chemical–mechanical polishing process of SiO2 surface by CeO2 particle10.1016/j.apsusc.2004.09.126 ↗
17. Interfacial reactivity between ceria and silicon dioxide and silicon nitride surfaces10.1149/1.1951203 ↗
18. Polymethylmethacrylate (PMMA)/CeO2 hybrid particles for enhanced chemical mechanical polishing performance10.1016/j.triboint.2014.10.013 ↗
19. Surface modification of ceria nanoparticles and their chemical mechanical polishing behavior on glass substrate10.1016/j.apsusc.2010.01.040 ↗
20. Novel polystyrene/CeO2-TiO2 multicomponent core/shell abrasives for high-efficiency and high-quality photocatalytic-assisted chemical mechanical polishing of reaction-bonded silicon carbide10.1016/j.apsusc.2019.04.037 ↗
21. Preparation of monodisperse polystyrene/silica core–shell nano-composite abrasive with controllable size and its chemical mechanical polishing performance on copper10.1016/j.apsusc.2011.09.074 ↗
22. Synthesis, characterization of CeO2@Zif-8 composite abrasives and their chemical mechanical polishing behavior on glass substrate10.1016/j.ceramint.2022.10.037 ↗
23. Development and characterization of a novel RE3+ doped core-shell CeO2 abrasive system and its glass CMP investigations10.1016/j.apsusc.2023.158055 ↗
24. Self-assembly of ceria/graphene oxide composite films with ultra-long antiwear lifetime under a high applied load10.1016/j.carbon.2014.11.063 ↗
25. Controlled growth cerium oxide nanoparticles on reduced graphene oxide for oxygen catalytic reduction10.1016/j.electacta.2016.01.129 ↗
26. In situ decorated optimized Ceo2 on reduced graphene oxide with enhanced absorptivity and visible light photocatalytic stability and reusability10.1021/acs.jpcc.6b04493 ↗
27. CeO2 modified graphene nanoplatelets composite powders enhanced the cathodic protection of waterborne zinc-rich epoxy coatings10.1007/s10965-020-02341-9 ↗
28. Efficient synthesis of graphene sheets using pyrrole as a reducing agent10.1016/j.carbon.2011.04.048 ↗
29. Facile synthesis of dendritic-like CeO2/rGO composite and application for detection of uric acid and tryptophan simultaneously10.1016/j.jssc.2021.122023 ↗
30. Development of carbon sphere/ceria (CS/CeO2) heterostructured particles and their applications to functional abrasives toward photochemical mechanical polishing10.1016/j.apsusc.2022.153449 ↗
31. Characterizations of in situ grown ceria nanoparticles on reduced graphene oxide as a catalyst for the electrooxidation of hydrazine10.1039/c3ta11311f ↗
32. One-step in situ synthesis of CeO2 nanoparticles grown on reduced graphene oxide as an excellent fluorescent and photocatalyst material under sunlight irradiation10.1039/C5CP04457J ↗
33. Self-assembly of CeO2 nanostructures/reduced graphene oxide composite aerogels for efficient photocatalytic degradation of organic pollutants in water10.1016/j.jallcom.2016.07.236 ↗
34. Development of polystyrene/polyaniline/ceria (PS/PANI/CeO2) multi-component abrasives for photochemical mechanical polishing/planarization applications10.1016/j.apsusc.2021.151784 ↗
35. Shallow trench isolation chemical mechanical planarization: a review10.1149/2.0071511jss ↗
36. Ceria concentration effect on chemical mechanical polishing of optical glass10.1016/j.apsusc.2006.10.074 ↗
37. The electronic structure of stoichiometric and reduced CeO2 surfaces: an XPS, UPS and HREELS study10.1016/0039-6028(94)90027-2 ↗
38. Meso-silica/Erbium-doped ceria binary particles as functionalized abrasives for photochemical mechanical polishing (PCMP)10.1016/j.apsusc.2021.149353 ↗
39. Flexible nano-cloth-like Ag cluster@rGO with ultrahigh SERS sensitivity for capture-optimization-detection due to effective molecule–substrate interactions10.1039/D2NR02033E ↗
40. Controlled synthesis of CeO2/graphene nanocomposites with highly enhanced optical and catalytic properties10.1021/jp3015113 ↗
41. Synthesis and characterization of a nanocomposite of goethite nanorods and reduced graphene oxide for electrochemical capacitors10.1016/j.jssc.2011.11.020 ↗
42. Finely tuned structure and catalytic performance of cerium oxides by a continuous samarium doping from 0 to 100%10.1021/acs.inorgchem.9b01979 ↗
43. Enhancing bifunctional electrocatalytic activities of oxygen electrodes via incorporating highly conductive Sm3+ and Nd3+ double-doped ceria for reversible solid oxide cells10.1021/acsami.0c17238 ↗
44. Silicon nitride chemical mechanical polishing mechanisms10.1149/1.1838893 ↗
45. Investigation of the effect of different cleaning forces on Ce-O-Si bonding during oxide post-CMP cleaning10.1016/j.apsusc.2021.149035 ↗
46. Increase in Ce3+ concentration of ceria nanoparticles for high removal rate of Sio2 in chemical mechanical planarization10.1149/2.0371709jss ↗
47. Improvement of oxide removal rate in chemical mechanical polishing by forming oxygen vacancy in ceria abrasives via ultraviolet irradiation10.1016/j.matchemphys.2021.124967 ↗
48. RE (La, Nd and Yb) doped CeO2 abrasive particles for chemical mechanical polishing of dielectric materials: experimental and computational analysis10.1016/j.apsusc.2019.144668 ↗
49. XRD and XPS studies of room temperature spontaneous interfacial reaction of CeO2 thin films on Si and Si3N4 substrates10.1039/C4RA09882J ↗
50. Humidity dependence of tribochemical wear of monocrystalline silicon10.1021/acsami.5b03043 ↗