Analysis of optical, structural, and morphological properties of a Ti-doped α-Fe2O3 thin film produced through RF and DC magnetron Co-sputtering
Source abstract
Abstract
In this study, a Titanium (Ti) doped alpha-Fe2O3 (hematite) thin layer was synthesized onto a glass substrate, employing the simultaneous DC and RF magnetron sputtering method. The investigation focused on examining specific physical properties of the film. The optical, structural, morphological, and elemental features of the resulting Ti-doped alpha-Fe2O3 thin film were characterized using different characterization techniques. The XRD studies indicated a rhombohedral crystal structure in the studied thin film. The calculation of the Eg value for the thin film, based on absorption measurements, resulted in a value of 2.19 eV. Raman peaks were identified within the range of 218 cm(-1) to 1300 cm(-1). According to SEM images, the thin film exhibited a uniform surface morphology across the substrate. AFM images revealed a low root mean square (RMS) roughness value, indicating a smooth Ti:Fe2O3 thin film surface.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Iron oxide chemistry and applications · Minerals Flotation and Separation Techniques · Magnetic Properties and Synthesis of Ferrites
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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