journal article·2022-02

Optimizing endurance performance of Ga2O3 random resistive access memories by altering oxygen vacancy content

Wenjing Li, Jiaxian Wan, Zexin Tu, Hui Li, Hao Wu, Chang Liu

Ceramics International· Volume 48· Issue 3
Publisher page

Abstract

Abstract In this work, we propose an effective way to improve the endurance performance of Ga2O3 resistive random access memories by doping ZnO. Excellent bipolar resistive switching behaviors have been observed in atomic-layer-deposited ZnO-doped Ga2O3 RRAMs, which exhibit large memory windows over 103 and retention time up to 104. Bipolar resistive switching behaviors can be explained by the formation or rupture of conductive filaments composed of Ag atoms and oxygen vacancies. Current – voltage curves suggest Ohmic conductance of the low resistance states, while the conductive mechanism of the high resistance states corresponds to the trap-assisted space charge limited conduction. Furthermore, the reason why the endurance performance of ZnO-doped Ga2O3 RRAMs is better than pure Ga2O3 RRAMs is analyzed.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Advanced Memory and Neural Computing · Ga2O3 and related materials · Transition Metal Oxide Nanomaterials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (39)

Show source-provided references
1. Recommended methods to study resistive switching devices10.1002/aelm.201800143 ↗
2. Metal–oxide RRAM10.1109/JPROC.2012.2190369 ↗
3. The future of electronics based on memristive systems10.1038/s41928-017-0006-8 ↗
4. Interface induced transition from bipolar resistive switching to unipolar resistive switching in Au/Ti/GaOx/NiOx/ITO structures10.1039/C5RA12762A ↗
5. Scaling the CBRAM switching layer diameter to 30 nm improves cycling endurance10.1109/LED.2017.2771718 ↗
6. Analog and digital bipolar resistive switching in solution combustion-processed NiO memristor10.1021/acsami.8b05749 ↗
7. Resistive switching characteristics of flexible TiO2 thin film fabricated by deep ultraviolet photochemical solution method10.1109/LED.2017.2756444 ↗
8. Stateful characterization of resistive switching TiO2 with electron beam induced currents10.1038/s41467-017-02116-9 ↗
9. Universal memory characteristics and degradation features of ZrO2-based bipolar resistive memory
10. A review of Ga2O3 materials, processing, and devices10.1063/1.5006941 ↗
11. Field-plated Ga2O3 MOSFETs with a breakdown voltage of over 750 V10.1109/LED.2015.2512279 ↗
12. Ultrahigh performance of self-powered β- Ga2O3 thin film solar-blind photodetector grown on cost-effective Si substrate using high temperature seed layer10.1021/acsphotonics.8b00174 ↗
13. Rapid response high temperature oxygen sensor based on titanium doped gallium oxide10.1038/s41598-019-54136-8 ↗
14. Abnormal bipolar resistive switching behavior in a Pt/GaO1.3/Pt structure10.1063/1.4927332 ↗
15. Effect of top electrode materials on bipolar resistive switching behavior of gallium oxide films10.1063/1.3501967 ↗
16. An indium-free transparent resistive switching random access memory10.1109/LED.2011.2126017 ↗
17. Effect of annealing treatment on performance of Ga2O3 conductive-bridging random-access memory10.1007/s11664-020-08177-9 ↗
18. Effect of oxygen concentration ratio on a Ga2O3-based resistive random access memory10.1109/ACCESS.2019.2948423 ↗
19. Effects of ZnO buffer layer on GZO RRAM devices10.1016/j.apsusc.2012.01.034 ↗
20. Improvement of resistive switching performances in ZnLaO Film by embedding a thin ZnO buffer layer10.1149/2.002309ssl ↗
21. Low thermal budget heteroepitaxial gallium oxide thin films enabled by atomic layer deposition10.1021/acsami.0c08477 ↗
22. Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition10.1016/j.cap.2018.11.013 ↗
23. Atomic layer deposition of Ga2O3 films using trimethylgallium and ozone10.1021/cm300712x ↗
24. Investigation of growth characteristics, compositions, and properties of atomic layer deposited amorphous Zn-doped Ga2O3 films10.1016/j.apsusc.2019.01.177 ↗
25. Low-temperature Al2O3 atomic layer deposition10.1021/cm0304546 ↗
26. Principle and applications of plasma enhanced atomic layer deposition
27. Rational design of ZnO:H/ZnO bilayer structure for high-performance thin-film transistors10.1021/acsami.5b10778 ↗
28. Atomic layer deposition of Ga2O3/ZnO composite films for high-performance forming-free resistive switching memory10.1021/acsami.0c06476 ↗
29. Highly tunable electrical properties in undoped ZnO grown by plasma enhanced thermal-atomic layer deposition10.1021/am300458q ↗
30. Plasma enhanced atomic layer deposition of Ga2O3 thin films10.1039/C4TA05007J ↗
31. Nanoionics-based resistive switching memories10.1038/nmat2023 ↗
32. Simplified theory of space-charge-limited currents in an insulator with traps10.1103/PhysRev.103.1648 ↗
33. Resistive switching mechanism in ZnxCd1−xS nonvolatile memory devices10.1109/LED.2006.887640 ↗
34. Influence of oxygen concentration on Resistance switching characteristics of gallium oxide10.1109/LED.2012.2206365 ↗
35. Observation of conducting filament growth in nanoscale resistive memories10.1038/ncomms1737 ↗
36. Fully room-temperature-fabricated nonvolatile resistive memory for ultrafast and high-density memory application10.1021/nl900006g ↗
37. Controllable growth of nanoscale conductive filaments in solid-electrolyte-based ReRAM by using a metal nanocrystal covered bottom electrode10.1021/nn1017582 ↗
38. Electron-injection-assisted generation of oxygen vacancies in monoclinic HfO210.1103/PhysRevApplied.4.064008 ↗
39. Physical mechanisms of endurance degradation in TMO-RRAM