Dot Line Pattern Formation in Photoresist Films by Mask-Guided LIPSS Formation Due to Excimer Laser Irradiation
Source abstract
Abstract
Micro-nano patterns are requested for various applications mimicking structures from nature.
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Advanced Surface Polishing Techniques · Advancements in Photolithography Techniques · Nanofabrication and Lithography Techniques
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References
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