Preparation and Properties of ZrW2O8 Thin Films Deposited by Pulsed Laser Deposition
Source abstract
Abstract
采用脉冲激光沉积法在石英基片上沉积制备了ZrW 2 O 8 薄膜. 用X射线衍射仪(XRD)、原子力显微镜(AFM)研究了不同衬底温度对薄膜结构组分、表面粗糙度和形貌的影响, 用台阶仪和分光光度计测量薄膜的厚度和不同衬底温度下制备薄膜的透射曲线, 用变温XRD分析了ZrW 2 O 8 薄膜的负热膨胀特性. 实验结果表明: 在衬底温度为室温、550℃和650℃下脉冲激光沉积的ZrW 2 O 8 薄膜均为非晶态, 非晶膜在1200℃保温3min后淬火得到立方相ZrW 2 O 8 薄膜; 随着衬底温度的升高, ZrW 2 O 8 薄膜的表面粗糙度明显降低; 透光率均约为80%, 在20~600℃温度区间内, 脉冲激光沉积制备的ZrW 2 O 8 薄膜的负热膨胀系数为-11.378×10 -6 K -1 .
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Thermal Expansion and Ionic Conductivity · Ferroelectric and Piezoelectric Materials · Magnetic and transport properties of perovskites and related materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (9)
Show source-provided references
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