A negative tone lift-off method for small metal holes using PMMA/SiO2 double layer
Source abstract
Abstract
We propose a novel method to fabricate small apertures in a metal film using polymethyl methacrylate (PMMA). A PMMA/SiO2 double layer is employed to perform a negative tone lift-off with SiO2 as a sacrificial layer. Through this method, we succeeded in making sub-50 nm holes in a metal film using well-established individual fabrication steps. The proposed method will be more reliable and economical compared to the hydrogen silsesquioxane/PMMA bilayer method.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Photonic and Optical Devices · Optical Coatings and Gratings · Semiconductor materials and devices
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References (14)
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