journal article·1995-06

Influence of ion-induced interfacial chemical reactivity on contact resistance

S T Lakshmikumar

Bulletin of Materials Science· Volume 18· Issue 3
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Semiconductor materials and devices · Semiconductor materials and interfaces · Copper Interconnects and Reliability

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (16)

Show source-provided references
1. Appleton B R, Zuhr R A, Noggle T S, Herbots N and Pennycook S J 1986MRS Sym. Proc. Photon, beam and plasma stimulated chemical processes at surfaces (eds) V M Donnelly, I P Hermann and M Hirose (New York: MRS) p 319
2. Chern J G J and Oldhiem W G 1984IEEE Electron Dev. Lett. 5 17810.1109/EDL.1984.25875 ↗
3. Cohen S S and Gildenblat G S 1986VLSI Science and Technology (ed.) N G Einspruch13 p. 87
4. Greene J E, Rockett A and Sundgren J E 1986MRS Sym. Proc. Photon, beam and plasma stimulated chemical processes at surfaces (eds) V M Donnelly, I P Hermann and M Hirose (New York: MRS) p. 39
5. Harper J M E, Cumo V J and Kaufmann H R 1983Ann. Reviews of Mater. Sci. (eds) R A Huggins, R H Bube and D A Vermilea13 413
6. Hovel H J 1975Semiconductors and semi-metals (eds) R K Willardson and A C Beer11 p. 110.1016/S0080-8784(08)62357-1 ↗
7. Itoh T, Nakamura T, Utomachi M and Sugiyama T 1977Jap. J. Appl. Phys. 16 55310.1143/JJAP.16.553 ↗
8. Kanicki J 1988Appl. Phys. Lett. 53 194310.1063/1.100330 ↗
9. Lakshmikumar S T and Rastogi A C 1989Appl. Phys. A48 32510.1007/BF00618893 ↗
10. Li P and Lu T M 1990Appl. Phys. Lett. 57 233610.1063/1.104169 ↗
11. Liu W T, Lakshmikumar S T, Knorr D B, Lu T M and van der Leeden Ir G A 1993Appl. Phys. Lett. 64 573
12. McNiel J R, Barron A C, Wilson S R and Hermann W C Jr. 1984Appl. Opt. 23 55210.1364/AO.23.000552 ↗
13. Mei S N and Lu T M 1988J. Vac. Sci. Technol. A6 910.1116/1.574977 ↗
14. Rastogi A C and Lakshmikumar S T 1989Solar Cells 26 32310.1016/0379-6787(89)90091-4 ↗
15. Takagi T, Tamada I and Sasaki A 1975Thin Solid Films 45 56910.1016/0040-6090(77)90248-6 ↗
16. Wong J, Mei S N and Lu T M 1986 inMRS Sym. Proc. Interfaces, superlattices and thin films (eds) J D Dow and I K Schuller (New York: MRS) p. 211