journal article·1995-09Open access

Preparation and characterization of ultra-thin cobalt silicide for VLSI applications

S Kal, I Kasko, H Ryssel

Bulletin of Materials Science· Volume 18· Issue 5

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Semiconductor materials and interfaces · Silicon and Solar Cell Technologies · Integrated Circuits and Semiconductor Failure Analysis

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